2020
DOI: 10.1007/s11082-020-02466-7
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Controllable formation of plasmonic gold nanoparticles by pulsed laser–induced etching

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Cited by 10 publications
(2 citation statements)
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“…This has resulted from the plasmonics effects of bimetallic nanoparticles (hotspot junctions and nanoparticle sizes). The fabricated Si nano-columns with Au-Ag alloy nanoparticles SERS pesticides sensors were tested under different Chlorpyrifos concentrations: 25X10 -8 , 12X10 -7 , 6 X10 -6, and 3X10 -5 M. The enhanced Raman peaks in the SERS spectra of Chlorpyrifos is ascribed to C-C stretching, P-O stretching, P=S stretching, C-Cl stretching and P-O-R stretching bonds at wavenumbers 345 cm -1 , 536 cm -1 , 615 cm -1 , 677 cm -1 and 1099 cm -1 [29] respectively. These Raman peaks are the fingerprint of Chlorpyrifos pesticide.…”
Section: Sensing Performance Of Nanophotonics Sers Pesticides Sensorsmentioning
confidence: 97%
“…This has resulted from the plasmonics effects of bimetallic nanoparticles (hotspot junctions and nanoparticle sizes). The fabricated Si nano-columns with Au-Ag alloy nanoparticles SERS pesticides sensors were tested under different Chlorpyrifos concentrations: 25X10 -8 , 12X10 -7 , 6 X10 -6, and 3X10 -5 M. The enhanced Raman peaks in the SERS spectra of Chlorpyrifos is ascribed to C-C stretching, P-O stretching, P=S stretching, C-Cl stretching and P-O-R stretching bonds at wavenumbers 345 cm -1 , 536 cm -1 , 615 cm -1 , 677 cm -1 and 1099 cm -1 [29] respectively. These Raman peaks are the fingerprint of Chlorpyrifos pesticide.…”
Section: Sensing Performance Of Nanophotonics Sers Pesticides Sensorsmentioning
confidence: 97%
“…[ 11 ] Crystalline Si surface can be structured in many ways; directly by pulsed laser, plasma, and wet etching. These periodic, [ 12,13 ] porous, [ 14–16 ] or black Si structures are also structured with synthesized plasmonic nanoparticles, [ 17 ] however; those substrates may suffer from the non‐uniformity of the localized surface plasmon resonance (LSPR) along the surface. Even with the uniform coating and strong hot‐spots, ion‐beam lithography techniques suffer from the fabrication costs, time, and small area.…”
Section: Introductionmentioning
confidence: 99%