2012
DOI: 10.1021/am3003473
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Controllable Fabrication of Patterned ZnO Nanorod Arrays: Investigations into the Impacts on Their Morphology

Abstract: Fabricating ZnO nanorod arrays with precisely controlled morphology, alignment, and density is highly desirable but rather challenging. On the other hand, understanding the parameters that affect their final morphology and the growth mechanisms is significant to integrate such patterned ZnO nanorod arrays in various applications. Therefore, ZnO nanorod arrays with different density and morphology were fabricated by electron beam lithography (EBL) combined with the hydrothermal methods in this work. The influen… Show more

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Cited by 48 publications
(31 citation statements)
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“…While previous reports of templated ZnO nanowire arrays have controlled array pitch [21][22][23][24][25], these reports did not simultaneously achieve (1) small template-hole diameter for singlenanowire growth and (2) high-resolution pitch-control for optimized charge collection. These characteristics are required to grow single nanowires at precise positions for maximum charge collection.…”
Section: Introductionmentioning
confidence: 91%
“…While previous reports of templated ZnO nanowire arrays have controlled array pitch [21][22][23][24][25], these reports did not simultaneously achieve (1) small template-hole diameter for singlenanowire growth and (2) high-resolution pitch-control for optimized charge collection. These characteristics are required to grow single nanowires at precise positions for maximum charge collection.…”
Section: Introductionmentioning
confidence: 91%
“…The precursor concentration can influence the relative growth rate of different orientations, which is the key factor in determining the overall morphology of the ZnO crystal. Moreover, the growth rate of non-polar facets {0110} is more sensitive to the precursor concentration change than polar facets {0001}, which has also been detected by Zhang et al [33]. In the T1 step, the supply of the growth units is stable during the early stage of crystal growth and, accordingly, the growth rate ratio of {0001} facets and {0110} facets changes very slightly.…”
Section: Resultsmentioning
confidence: 54%
“…Several strategies have been proposed to fabricate highly ordered ZnO NAs, such as nanosphere lithography (NSL) [64][65][66][67][68], electron beam lithography (EBL) [69][70][71][72], optical lithography (OL), and laser interference lithography (LIL) techniques [73][74][75][76][77][78][79][80]. Among these, self-assembled NSL is a simple and economical technique, which employs twodimensional (2D) self-assembled nanometer-sized polystyrene spheres as lithography masks to fabricate patterned arrays [64].…”
Section: Synthetic Methodologies and Properties For Patterned Zno Nasmentioning
confidence: 99%
“…The morphology and orientation of ZnO NAs can be effectively controlled by tailoring the thickness of the seed layer and solution concentration. EBL is a high-resolution maskless lithography technique, in which a focused electron beam is used to record predetermined shapes on photoresist (PR) materials [70]. Through this method, highly oriented ZnO NAs with controllable diameter and tunable pattern density were obtained.…”
Section: Synthetic Methodologies and Properties For Patterned Zno Nasmentioning
confidence: 99%