2013
DOI: 10.1063/1.4840735
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Control of plasma profile in microwave discharges via inverse-problem approach

Abstract: In the manufacturing process of semiconductors, plasma processing is an essential technology, and the plasma used in the process is required to be of high density, low temperature, large diameter, and high uniformity. This research focuses on the microwave-excited plasma that meets these needs, and the research target is a spatial profile control. Two novel techniques are introduced to control the uniformity; one is a segmented slot antenna that can change radial distribution of the radiated field during opera… Show more

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Cited by 7 publications
(3 citation statements)
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“…Some efforts of simulation-based optimization of process systems have been presented by Chiu et al, 25 Mitrovic et al, 26 Cheng et al, 27 and Po et al 28 A positive simulation model integrated with an optimal algorithm is a preferred architecture for these approaches to solve the inverse problems. Yasaka et al 29,30 briefly elaborated this inverse problem and proposed a novel simulation-based approach that made the plasma profile approximate the expected one via an appropriate control of the input power along the radial direction of the electrode. Additionally, the inverse problem is similar to a closed-loop control system, so it may be a feasible solution to employ an appropriate system control strategy.…”
Section: Introductionmentioning
confidence: 99%
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“…Some efforts of simulation-based optimization of process systems have been presented by Chiu et al, 25 Mitrovic et al, 26 Cheng et al, 27 and Po et al 28 A positive simulation model integrated with an optimal algorithm is a preferred architecture for these approaches to solve the inverse problems. Yasaka et al 29,30 briefly elaborated this inverse problem and proposed a novel simulation-based approach that made the plasma profile approximate the expected one via an appropriate control of the input power along the radial direction of the electrode. Additionally, the inverse problem is similar to a closed-loop control system, so it may be a feasible solution to employ an appropriate system control strategy.…”
Section: Introductionmentioning
confidence: 99%
“…Yasaka et al. 29,30 briefly elaborated this inverse problem and proposed a novel simulation-based approach that made the plasma profile approximate the expected one via an appropriate control of the input power along the radial direction of the electrode. Additionally, the inverse problem is similar to a closed-loop control system, so it may be a feasible solution to employ an appropriate system control strategy.…”
Section: Introductionmentioning
confidence: 99%
“…In this paper we present a two-dimensional calculation of wave propagation and power absorption in a nonuniform plasma immersed in non-uniform static magnetic field [8] based on the linear hot plasma theory. Bidirectional property of the helical antenna is investigated numerically by using a simple model antenna that approximates the helical antenna.…”
Section: Introductionmentioning
confidence: 99%