Rapid and reliable processing methods
for forming ordered block
copolymer (BCP) materials with low defect density in a thin film geometry
are required for many nanotechnology applications. Vertically aligned
BCP structures, in particular, have applications ranging from nanolithography
for electronics and photonics applications to nanoporous membranes
for water remediation and novel batteries for flexible electronics.
However, the attainment of a nearly complete vertical orientational
order of the BCP-ordered phase remains challenging. Solvent-based
techniques, such as direct immersion annealing (DIA) and solvent vapor
annealing (SVA), have immense potential for these applications of
BCP films, as it allows for a ‘tuning’ of their thermodynamic,
structural, and chain mobility-driven kinetic properties. We first
demonstrate that DIA, using a judicious choice of binary solvent mixtures,
along with a relatively hydrophobic ionic liquid (IL), induces the
rapid vertical ordering in polystyrene-b-poly(methyl
methacrylate) (PS-PMMA) in lamellae-forming block copolymer films.
The IL in a binary solvent mixture with toluene and heptane apparently
gives rise to a near-neutral solvent for the BCP for itself and the
boundary that is useful for attaining the vertical microstructure
within the BCP film. Next, we show that an IL can moreover suppress
the dewetting of the PS-PMMA films to achieve long-range order using
SVA in cylindrical films after long annealing times. Both vertical
and horizontal morphologies are attained in these films by selecting
different solvent conditions. Attaining enhanced vertical and horizontal
BCP structures with long-range defect-free order by tuning solvent
quality and using additives like ILs can render them useful for many
nanotech applications.