2019
DOI: 10.1103/physrevapplied.11.014003
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Control of Electron-State Coupling in Asymmetric Ge/SiGe Quantum Wells

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Cited by 25 publications
(42 citation statements)
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“…At high magnifications ( Fig. 1c,d), STEM shows sharp and abrupt interfaces, with a broadening due to SiGe intermixing in the order of 0.8 nm [21]. The quality of the heterointerfaces is confirmed by the low value of the rootmean-square interface roughness which was estimated to be 0.18 nm by atomic probe tomography measurements performed on the same set of samples [30].…”
Section: Methodsmentioning
confidence: 77%
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“…At high magnifications ( Fig. 1c,d), STEM shows sharp and abrupt interfaces, with a broadening due to SiGe intermixing in the order of 0.8 nm [21]. The quality of the heterointerfaces is confirmed by the low value of the rootmean-square interface roughness which was estimated to be 0.18 nm by atomic probe tomography measurements performed on the same set of samples [30].…”
Section: Methodsmentioning
confidence: 77%
“…Among different samples, wt= 5.0 nm is kept constant, wL is varied between 11.3 and 16.0 nm and bt ranges between 2.3 and 5 nm. xGe has been set to 0.81 or 0.87, with the higher Ge composition describing the more pronounced SiGe intermixing for bt< 3 nm [21]. The wide well is n-doped by phosphine codeposition over a thickness t= 10 nm.…”
Section: Methodsmentioning
confidence: 99%
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“…The ACQW modules are separated by a 21-nm thick Si 0.2 Ge 0.8 spacer. The detailed structural characterization of the samples shows the high quality of the heterostructures and reproducibility of deposited thickness in the subnanometer range [25]. The samples investigated here were n-doped by P co-deposition in the wide Ge well.…”
Section: Introductionmentioning
confidence: 91%
“…Similar to the FTIR experiment, the samples were kept at cryogenic temperatures (TL = 6 K) in an optical He-flow cryostat. More experimental details can be found in References [22,25]. The TM-polarized electric field direction is indicated with a double-headed arrow.…”
Section: Introductionmentioning
confidence: 99%