2002
DOI: 10.1134/1.1478540
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Control of charge transport mode in the Schottky barrier by δ-doping: Calculation and experiment for Al/GaAs

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Cited by 38 publications
(21 citation statements)
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“…In it, the measurements of the δ-doped Schottky diodes (η > 1), which are in thermodynamic equilibrium with the surrounding medium, are described. The diodes are manufactured by the team of V. I. Shashkin at the Institute for Physics of Microstructures of the Russian Academy of Sciences [12,13]. It is shown that the modified van der Ziel relation agrees with the experimental data.…”
Section: Introductionsupporting
confidence: 59%
See 1 more Smart Citation
“…In it, the measurements of the δ-doped Schottky diodes (η > 1), which are in thermodynamic equilibrium with the surrounding medium, are described. The diodes are manufactured by the team of V. I. Shashkin at the Institute for Physics of Microstructures of the Russian Academy of Sciences [12,13]. It is shown that the modified van der Ziel relation agrees with the experimental data.…”
Section: Introductionsupporting
confidence: 59%
“…The diodes were manufactured at the Institute for Physics of Microstructures of the Russian Academy of Sciences using the same technology (see [12,13]) and differed by the initial differential resistance R 0 (with the total current I = I D + I leak = 0).…”
Section: Resultsmentioning
confidence: 99%
“…For a small distance from the interface to the δ-layer the peak of a potential barrier becomes tunnel transparent and this leads to reduced effective Schottky barrier height in the range 0.7÷0.1 eV [12,13]. Metalorganic chemical vapor deposition is used for fabrication all layers, including top aluminum layer without braking growth conditions.…”
Section: Detector Principal Characteristicsmentioning
confidence: 99%
“…The area of each barrier transition was 50 × 50 μm 2 . The lowering of the effective Schottky barrier height was achieved by surface δ-doping of the semiconductor layer by silicon [12]. The effective barrier height of the transitions amounted to 0.29 eV.…”
Section: Introductionmentioning
confidence: 99%
“…This is achieved by using MS transitions with low effective barrier height. Such a lowering of the effective barrier height can be provided by different methods, for example, by δ-doping of a semiconductor near its boundary with the metal [11], [12].…”
Section: Introductionmentioning
confidence: 99%