2013
DOI: 10.1016/j.surfcoat.2013.04.017
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Control of calcium phosphate thin film stoichiometry using multi-target sputter deposition

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Cited by 51 publications
(78 citation statements)
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“…RF magnetron sputtering of CaP thin films has been shown to offer significant advantages over other deposition techniques due to the fact that it can offer significant control over the processing conditions [104]. An extensive range of sputter deposition parameters have been investigated and shown to influence the properties of the resultant HA-based surfaces, including discharge power level [105], gas pressure [106], thermal processing conditions [107], and target stoichiometry [99,100,108].…”
Section: Antimicrobial and Bioactive Coatingsmentioning
confidence: 99%
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“…RF magnetron sputtering of CaP thin films has been shown to offer significant advantages over other deposition techniques due to the fact that it can offer significant control over the processing conditions [104]. An extensive range of sputter deposition parameters have been investigated and shown to influence the properties of the resultant HA-based surfaces, including discharge power level [105], gas pressure [106], thermal processing conditions [107], and target stoichiometry [99,100,108].…”
Section: Antimicrobial and Bioactive Coatingsmentioning
confidence: 99%
“…An extensive range of sputter deposition parameters have been investigated and shown to influence the properties of the resultant HA-based surfaces, including discharge power level [105], gas pressure [106], thermal processing conditions [107], and target stoichiometry [99,100,108]. For a given operational condition, the target composition and stoichiometry can directly influence the Ca/P ratio of the sputter-deposited surface [104]. The content of the silicon was 1.2 and 4.6 at.% for the coatings prepared using the Si-HA precursor powders with a chemical formula of Ca 10 (PO 4 ) 6-x (SiO 4 ) x (OH) 2-x , where x = 0.5 and 1.72.…”
Section: Antimicrobial and Bioactive Coatingsmentioning
confidence: 99%
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“…Однако в научно-технической литературе на сегодняшний день практически отсутствует информация по модифицированию поверхности биорезорбируемых полимеров в плазме аномально тлеющего разряда, возникающего в процессе высокочастотного магнетронного распыления (ВЧМР) твердых диэлектрических мишеней. Вместе с тем, применение метода ВЧМР для модификации биорезорбируемых полимеров позволяет в широких пределах изменять химический состав обрабатываемой поверхности, не только путём изменения рабочей атмосферы, но и путём изменения состава распыляемой мишени [14,15].…”
Section: Introductionunclassified
“…As shown by Lo et al, Radio frequency (RF) magnetron sputtering has proven to be a useful technique for the controlled deposition of dense uniform thin films of controlled crystallinity of HA and single and mixed phases of CaP based targets [16][17][18][19] . In addition a number of bioactive silicate glass compositions have been sputtered, including the composition deposited by Stan and Berbecaru et al SiO2-40.5 CaO-32 P2O5-1.5 Na2O-9 MgO-17 mol% which showed the formation of apatite in vitro following submersion in Simulated Body Fluid (SBF) [20][21][22][23][24][25] .…”
Section: Introductionmentioning
confidence: 99%