“…One of the implementations of high-sensitive active sensors is based on the grating coupler effect for the excitation of surface plasmon-polaritons (SPP) [1] in the surface-barrier heterostructures with Schottky barrier [2, 3]. Today, there are several techniques of forming a diffraction grating on the semiconductor substrate, namely, the laser-induced periodic surface structures [4], extreme ultraviolet lithography [5], electron beam lithography [6], ion beam lithography [7], nanoimprint technology [8], pulsed laser interference lithography [9], and laser interference lithography [10, 11].…”