Continuum and Molecular Modeling of Chemical Vapor Deposition at Nano-Scale Fibrous Substrates
Himel Barua,
Alex Povitsky
Abstract:Chemical vapor deposition (CVD) is a common industrial process that incorporates a complex combination of fluid flow, chemical reactions, and surface deposition. Understanding CVD processes requires rigorous and costly experimentation involving multiple spatial scales, from meters to nanometers. The numerical modeling of deposition over macro-scale substrates has been conducted in the literature and results show compliance with experimental data. For smaller-scale substrates, where the corresponding Knudsen nu… Show more
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