2010 35th IEEE Photovoltaic Specialists Conference 2010
DOI: 10.1109/pvsc.2010.5617113
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Continuous in-line processing of CdS/CdTe devices: Process control using XRF and efficient heating

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Cited by 7 publications
(3 citation statements)
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“…In this system, an automated magnetic transfer arm moves the substrate into any of nine process positions in any programmed sequence. Each process position consists of a graphite top heater and a bottom graphite heater or shuttered sublimation source, each with an integrated resistive heater . The purpose of the top heater is to control the substrate temperature by radiatively heating or cooling the high‐emissivity, uncoated top of the glass.…”
Section: Methodsmentioning
confidence: 99%
“…In this system, an automated magnetic transfer arm moves the substrate into any of nine process positions in any programmed sequence. Each process position consists of a graphite top heater and a bottom graphite heater or shuttered sublimation source, each with an integrated resistive heater . The purpose of the top heater is to control the substrate temperature by radiatively heating or cooling the high‐emissivity, uncoated top of the glass.…”
Section: Methodsmentioning
confidence: 99%
“…CdS films of thicknesses ranging from 30nm to 200nm were deposited by thermal sublimation on TEC10 glass substrates using the Advanced R&D System [18] at the PV Materials Engineering Lab at Colorado State University. These film samples were then studied for pinholes presence, identifying sources of pinholes; identifying pinholes from fully covered films, and show elemental composition of pinholes and fully covered films.…”
Section: Methodsmentioning
confidence: 99%
“…In general, the standard HPD process is performed in a low vacuum environment where the substrate is first introduced into a CdS depositing source [8]- [9]. For this study, the plasma cleaning system was integrated into an empty HPD graphite source and placed in-line with the process.…”
Section: Introductionmentioning
confidence: 99%