Abstract:We present a summary of contamination monitoring methods currently being used on extreme ultraviolet (EUV) astronomy instruments and in EUV calibration facilities at the Space Sciences Laboratory, U.C. Berkeley. Methods include measurement of contamination -induced optical degradation on EUV witness samples as well as measurement and characterization of contamination on non -optical hardware. EUV witness samples, fabricated in the same manner as novel grazing incidence EUV telescope mirrors, are measured for r… Show more
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