2016
DOI: 10.1016/j.orgel.2015.11.009
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Contact-resistance effects in PDI8-CN 2 n-type thin-film transistors investigated by Kelvin-probe potentiometry

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Cited by 30 publications
(21 citation statements)
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“…The trend of R C versus V DS has not been as extensively studied as R C versus V GS , but through SKPM Chiarella et al found that R C decreased with increasing V DS in an exponential fashion . Contact resistance had a stronger dependence on V DS than V GS , a trend also found by Chianese et al Furthermore, both studies found that R D was substantially greater than R S , indicating that their n‐type devices were not injection limited as expected of a device with high R C …”
Section: Characterizing Contact Resistance In Ofetsmentioning
confidence: 87%
“…The trend of R C versus V DS has not been as extensively studied as R C versus V GS , but through SKPM Chiarella et al found that R C decreased with increasing V DS in an exponential fashion . Contact resistance had a stronger dependence on V DS than V GS , a trend also found by Chianese et al Furthermore, both studies found that R D was substantially greater than R S , indicating that their n‐type devices were not injection limited as expected of a device with high R C …”
Section: Characterizing Contact Resistance In Ofetsmentioning
confidence: 87%
“…Other groups have measured the built-in potential of single-layer MoS 2 heterojunctions using KPFM [30] and demonstrated the electrical properties of the contact between MoS 2 and different metals [31]. These measurements resemble the use of KPFM for contact resistance evaluation [32] and contact-free mobility estimation [33] in thin-film organic transistors.…”
Section: Introductionmentioning
confidence: 99%
“…Taking inspiration from a previous work by the Northwestern University's group [67], we also verified, for PDI8-CN2 transistors, the possibility to reduce the impact of the contact resistance effect by using a suitable functionalization of the gold electrodes with a 4-chlorobenzenemethanethiol self-assembling monolayer. Despite a beneficial effect being unambiguously verified in this way, the overall reduction of RC was quite limited to a factor between 30% and 15% depending on the film thickness [62]. Supplementary efforts were carried out to investigate the RC behavior as a function of temperature.…”
Section: R C Evaluation Using Kelvin Probe Microscopymentioning
confidence: 90%
“…Further SKPM measurements also demonstrated that R C effects tend to be magnified when the thickness of the organic layer is decreased down to 10 nm. As an example, for the PDI8-CN 2 OFET, the R C value is enhanced by a factor larger than 5× when the organic layer thickness goes from 20 to 6 nm [62]. Taking inspiration from a previous work by the Northwestern University's group [67], we also verified, for PDI8-CN 2 transistors, the possibility to reduce the impact of the contact resistance effect by using a suitable functionalization of the gold electrodes with a 4-chlorobenzenemethanethiol self-assembling monolayer.…”
Section: R C Evaluation Using Kelvin Probe Microscopymentioning
confidence: 99%
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