2016
DOI: 10.1016/j.jmmm.2016.03.043
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Constricted nanowire with stabilized magnetic domain wall

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Cited by 18 publications
(10 citation statements)
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“…The stability and the behavior of DW in constricted nanowires was investigated theoretically and experimentally using notches. [77][78][79][80][81][82][83] Figure 7 shows the symmetrical and asymmetrical transverse-type DWs obtained for small and large nanoconstrictions, respectively. [77] It was observed that the width of the DW decreases with the nanoconstriction size.…”
Section: Synapses Based On Multilevel Magnetic Dwmentioning
confidence: 99%
See 2 more Smart Citations
“…The stability and the behavior of DW in constricted nanowires was investigated theoretically and experimentally using notches. [77][78][79][80][81][82][83] Figure 7 shows the symmetrical and asymmetrical transverse-type DWs obtained for small and large nanoconstrictions, respectively. [77] It was observed that the width of the DW decreases with the nanoconstriction size.…”
Section: Synapses Based On Multilevel Magnetic Dwmentioning
confidence: 99%
“…Differently, a stepped nanowire based on two connected wires with an offset in both x and y directions was proposed, as shown in Figure 8a. [57,81] The micromagnetic simulation showed a strong dependence on the pinning field (blocking the DW inside the stepped area) and the device geometry. [81] As the value of d increases, the DW becomes strongly pinned as a result of the strong confinement.…”
Section: Synapses Based On Multilevel Magnetic Dwmentioning
confidence: 99%
See 1 more Smart Citation
“…In 2016, S. R. Sbiaa et al 14 carried out an extensive research and proposed a novel technique for attaching a domain wall (DW) with the appropriate orientation to a generic model of a magnetic nanowire. The current paper further extends this work by investigating the variation in the parameters and modeling the generic model of a nanowire, carrying out simulations of the magnetization profile in a GPU-accelerated framework.…”
Section: Introductionmentioning
confidence: 99%
“…In the studies carried out so far, the pinning sites for DW devices were fabricated by traditional lithography process by modifying the geometry, e.g., creation of notches or staggered patterns in the ferromagnetic nanowire . Exchange bias field to pin DWs has also been proposed in the past .…”
mentioning
confidence: 99%