2007
DOI: 10.1109/tdmr.2007.901178
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Constant-Current Stressing of SiCr-Based Thin-Film Resistors: Initial “Wearout” Investigation

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Cited by 13 publications
(1 citation statement)
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“…An explanation for this trend may lie with morphological changes in the wire prior to the EM that are induced by the high current densities needed to drive self-heating at lower T env . Microstructural annealing of metal nanowires under high current is a well known process that can ultimately decrease electron scattering rates (and thus the electron wind force) by healing defects and merging grains [31][32][33][34][35]. It is possible that as T env drops and the critical currents necessary to sustain elevated temperatures increase, the wire become increasingly hardened against EM by current annealing on the ramp prior to EM onset.…”
Section: Critical Junction Temperature In Nanowiresmentioning
confidence: 99%
“…An explanation for this trend may lie with morphological changes in the wire prior to the EM that are induced by the high current densities needed to drive self-heating at lower T env . Microstructural annealing of metal nanowires under high current is a well known process that can ultimately decrease electron scattering rates (and thus the electron wind force) by healing defects and merging grains [31][32][33][34][35]. It is possible that as T env drops and the critical currents necessary to sustain elevated temperatures increase, the wire become increasingly hardened against EM by current annealing on the ramp prior to EM onset.…”
Section: Critical Junction Temperature In Nanowiresmentioning
confidence: 99%