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1995
DOI: 10.1016/0022-0248(95)00044-5
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Congruent vaporization of GaAs(s) and stability of Ga(l) droplets at the GaAs(s) surface

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Cited by 54 publications
(38 citation statements)
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“…24 In this conditions Ga and As fluxes impinge on the whole exposed sample surface (substrate and NW sidewalls) but desorption of As occurs much faster than that of Ga. Arsenic remains therefore almost in the vapor phase, while Ga adatoms diffuse on the surface and toward the growth front at the NW tip. The As/Ga abundance ratio therefore depends on all factors that may affect Ga arrival rate at the NW tip, such as local temperature fluctuations 25 and different collection areas (e.g.…”
Section: Discussionmentioning
confidence: 98%
“…24 In this conditions Ga and As fluxes impinge on the whole exposed sample surface (substrate and NW sidewalls) but desorption of As occurs much faster than that of Ga. Arsenic remains therefore almost in the vapor phase, while Ga adatoms diffuse on the surface and toward the growth front at the NW tip. The As/Ga abundance ratio therefore depends on all factors that may affect Ga arrival rate at the NW tip, such as local temperature fluctuations 25 and different collection areas (e.g.…”
Section: Discussionmentioning
confidence: 98%
“…At temperatures of 670 C, Ga droplets readily etch GaAs [17][18][19] and also move across the surface driven by a disequilibrium between the droplet and the surface during Langmuir evaporation.…”
mentioning
confidence: 99%
“…The value of the kinetic coefficient μ As depends on the surface tension at the interface solid-liquid phase σ sl − in our case it is the interface between the GaAs solid phase and the liquid phase of Ga-As with composition, corresponding to liquidus line. Many investigations are dedicated to the surface tension in the systems Ga-Sn [30,31], Ga-In [31], Ga-Tl [32], Ga-GaAs [33]. In the reference [34] the surface tensions at the interfaces solid-liquid phase, solid-vapor phase and liquid-vapor phase have been determined for GaAs LPE growth.…”
Section: Resultsmentioning
confidence: 99%