2017
DOI: 10.1002/adsu.201600041
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Conformal Nitrogen‐Doped TiO2 Photocatalytic Coatings for Sunlight‐Activated Membranes

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Cited by 69 publications
(45 citation statements)
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“…ALD is a technique commonly used in microelectronics and semiconductor fabrication in which alternating vapor pulses react on a surface to enable layer‐by‐layer conformal growth . In such a conformal regime, ALD allows for membranes to be functionalized with metal oxides without substantially changing the pore geometry . Oxides grown on porous materials simply constrict the pore size and introduce a roughness associated with the particular metal oxide .…”
Section: Introductionmentioning
confidence: 99%
“…ALD is a technique commonly used in microelectronics and semiconductor fabrication in which alternating vapor pulses react on a surface to enable layer‐by‐layer conformal growth . In such a conformal regime, ALD allows for membranes to be functionalized with metal oxides without substantially changing the pore geometry . Oxides grown on porous materials simply constrict the pore size and introduce a roughness associated with the particular metal oxide .…”
Section: Introductionmentioning
confidence: 99%
“…There are numerous methods of PMs production, for example: Atomic layer deposition (ALD) [57,70,71] and chemical vapor deposition [58]; 7.…”
Section: Pmrs With Immobilized Photocatalyst (Pmrs With Pms)mentioning
confidence: 99%
“…It was reported that the prepared N-doped TiO 2 had excellent photocatalytic activity with complete the degradation of RR4 after 60 min [11]. In addition, conformal thin films of nitrogen doped TiO 2 on membranes have been fabricated of via atomic layer deposition (ALD) resulting in a lowered band gap with enhanced permeance and photocatalytic activity for degrading organic pollutants under solar irradiation [12]. Recently, an N-doped TiO 2 photocatayst was successfully synthesized through acid modified sol-gel method [13].…”
Section: Introductionmentioning
confidence: 99%