Confinement of Block Copolymers on Patterned Surfaces

Li, Z.; Qu, S.; Rafailovich, Miriam; Sokolov, Jonathan; Tolan, Metin; Turner, Matthew S.; Wang, J.; Schwarz, S. A.; Lorenz, H.; Kotthaus, J. P.

doi:10.1021/ma9615009

Cited by 41 publications

(35 citation statements)

References 25 publications

(83 reference statements)

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“…Heier et al have succeeded in templating surface domain structures on smooth substrates that were chemically patterned by microcontact printing on a scale of 1-16 mm [141]. Similar patterning of island and holes has been shown for sphere-forming [142] and lamellar [143] block copolymers on a topographically patterned substrates. Several more studies have investigated the effect of surface patterning on block copolymer orientation and order and these will be discussed later in this review.…”

Section: Film Thicknessmentioning

confidence: 78%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

931

921

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The nanometer-scale architectures in thin films of self-assembling block copolymers have inspired a variety of new applications. For example, the uniformly sized and shaped nanodomains formed in the films have been used for nanolithography, nanoparticle synthesis, and high-density information storage media. Imperative to all of these applications, however, is a high degree of control over orientation of the nanodomains relative to the surface of the film as well as control over order in the plane of the film. Induced fields including electric, shear, and surface fields have been demonstrated to influence orientation. Both heteroepitaxy and graphoepitaxy can induce positional order on the nanodomains in the plane of the film. This article will briefly review a variety of mechanisms for gaining control over block copolymer order as well as many of the applications of these materials. Particular attention is paid to the potential of perfecting long-range two-dimensional order over a broader range of length scales and the extension of these concepts to functional materials and more complex architectures. #

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Section: Film Thicknessmentioning

confidence: 78%

Patterning with block copolymer thin films

Segalman

2005

Materials Science and Engineering: R: Reports

931

921

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“…[9][10][11][12][13][14][15] Control over the microdomain orientation and lateral order is essential in this application, and a number of strategies have been developed to achieve this goal. To this end, controlled interfacial interactions 1,[16][17][18] and external fields, like electric fields, [19][20][21][22] solvent evaporation, [23][24][25][26][27] epitaxy, [28][29][30] and surface patterning [31][32][33][34][35][36] have been used. Perhaps the simplest of these is the control of interfacial interactions where a microphase-separated diblock copolymer is placed on a surface to which a random copolymer, containing the same constituents as the diblock copolymer, has been anchored or covalently attached.…”

Section: Introductionmentioning

confidence: 99%

Surface Modification with Cross-Linked Random Copolymers: Minimum Effective Thickness

et al. 2007

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Ultrathin films of benzocyclobutene (BCB)-functionalized random copolymer with styrene and methyl methacrylate, P(S-r-BCB-r-MMA), with thicknesses ranging from 0 to 10.5 nm, were thermally crosslinked on Si substrates. The penetration of deuterated PMMA (dPMMA) into the P(S-r-BCB-r-MMA) films and the microdomain orientation of PS-b-PMMA diblock copolymers on P(S-r-BCB-r-MMA) coated substrates were investigated by neutron reflectivity (NR) and scanning force microscopy (SFM), respectively. NR measurements on bilayers of dPMMA on cross-linked P(S-r-BCB-r-MMA) showed that the neutron scattering length density (SLD) at the substrate was equal to that of P(S-r-BCB-r-MMA) if the P(S-r-BCB-r-MMA) film was thicker than ∼5.5 nm. With decreasing thickness of the P(S-r-BCB-r-MMA) film, the SLD at the substrate increased, characteristic of an increasing penetration of the dPMMA. When thin films of PS-b-PMMA diblock copolymer having cylindrical microdomains are placed on surfaces modified with cross-linked films of P(S-r-BCB-r-MMA) thinner than ∼5.5 nm, the cylindrical microdomains orient parallel to the surface, whereas for thicker films, the microdomains orient normal to the surface. Both of these results indicate that interfacial interactions are screened when the P(S-r-BCB-r-MMA) film is thicker than ∼5.5 nm.

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“…The situation is quite different, however, when one or both confining surfaces contain either chemical inhomogeneities 20,21 or physical corrugations. 22,23 In the presence of chemical heterogeneities, different parts of the substrate will have preferences for different subchains of the BCP molecules, and the resulting morphology of the thin films will be radically different from the ones studied for a laterally homogeneous substrate.…”

Section: Introductionmentioning

confidence: 99%

Block copolymer films on patterned surfaces

Chen¹

1998

J. Polym. Sci. B Polym. Phys.

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We present results from a numerical study of a coarse‐grained model of diblock copolymer (BCP) thin films cast on a chemically patterned surface. The patterned surface contains chemical inhomogeneities with a repeat spacing length scale comparable to the linear size of the BCP molecules. We find that the orientation of the lamellae in the thin film and the overlap of the film morphology with the preassigned surface pattern is strongly influenced by the commensurability between the bulk unconstrained lamellar size λ*, and the linear size of the surface inhomogeneities w. PACS Numbers: 64.60.Cn, 61.41.+e, 64.60.My, 64.75.+g. © 1998 John Wiley & Sons, Inc. J Polym Sci B: Polym Phys 36: 3127–3136, 1998

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Confinement of Block Copolymers on Patterned Surfaces

Cited by 41 publications

References 25 publications

Patterning with block copolymer thin films

Patterning with block copolymer thin films

Surface Modification with Cross-Linked Random Copolymers: Minimum Effective Thickness

Block copolymer films on patterned surfaces

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