2023
DOI: 10.1021/acs.nanolett.2c02640
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Configurable Crack Wall Conduction in a Complex Oxide

Abstract: Mobile defects in solid-state materials play a significant role in memristive switching and energy-efficient neuromorphic computation. Techniques for confining and manipulating point defects may have great promise for low-dimensional memories. Here, we report the spontaneous gathering of oxygen vacancies at strain-relaxed crack walls in SrTiO 3 thin films grown on DyScO 3 substrates as a result of flexoelectricity. We found that electronic conductance at the crack walls was enhanced compared to the crack-free … Show more

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Cited by 8 publications
(10 citation statements)
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References 51 publications
(58 reference statements)
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“…The vertical length scale (depth) of the nanocracks varies from 17 to 53 nm (Figure S5), which means that the nanocracks in the investigated films are deeper than the film thickness. Similar penetration of nanocracks into the substrates has been reported in the earlier oxide thin film studies. , …”
Section: Resultssupporting
confidence: 85%
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“…The vertical length scale (depth) of the nanocracks varies from 17 to 53 nm (Figure S5), which means that the nanocracks in the investigated films are deeper than the film thickness. Similar penetration of nanocracks into the substrates has been reported in the earlier oxide thin film studies. , …”
Section: Resultssupporting
confidence: 85%
“…Similar penetration of nanocracks into the substrates has been reported in the earlier oxide thin film studies. 14,16 This depth variation suggests that most nanocracks, which are originally generated inside the SRO/STO bilayer, penetrate the STO buffer and propagate into the top region of the KTO substrate. This behavior can be understood by considering the thermal expansion coefficients of the constituting materials, namely, SRO (α L = 1.13 × 10 −5 K −1 ), STO (α L = 9.4 × 10 −6 K −1 ), and KTO (α L = 4.027 × 10 −6 K −1 ), at room temperature.…”
Section: Resultsmentioning
confidence: 99%
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