2006
DOI: 10.1063/1.2193160
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Conductivity analysis of n-GaAs molecular beam epitaxial layers using multicarrier fitting

Abstract: We have set up a model for the energy-dependent lifetime, including the effects of the charge carrier collisions with ionized impurities, polar optical phonons, and space charge. The model is then used to compute the mobility spectrum at each temperature, which used to compute the pertinent magnetic-field-dependent Hall parameters. The computed Hall parameters compared can then be measured values to estimate the validity of the lifetime model and parameters. The method has been applied to two n-GaAs∕SI–GaAs ep… Show more

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Cited by 3 publications
(18 citation statements)
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“…The InAs samples have the lowest (Table 2). The results are presented in Figures 3, 4, 5, 6, 7, 8, 9, and 10 with the parameters used to solve the neutrality equation (according to [3,32]). In addition to the results presented in [28], we provide the Hall curves calculated by using the dependence = ⟨ 2 ,ℎ ⟩/⟨ ,ℎ ⟩ 2 and the calculated values of , , and 2 versus temperature in Figures 11, 12, 13, and 14. we used the metallurgical thickness of the epitaxial layer, which allowed us to calculate the conformity between the thickness values used to solve for the concentration and resistivity versus temperature.…”
Section: Methodsmentioning
confidence: 99%
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“…The InAs samples have the lowest (Table 2). The results are presented in Figures 3, 4, 5, 6, 7, 8, 9, and 10 with the parameters used to solve the neutrality equation (according to [3,32]). In addition to the results presented in [28], we provide the Hall curves calculated by using the dependence = ⟨ 2 ,ℎ ⟩/⟨ ,ℎ ⟩ 2 and the calculated values of , , and 2 versus temperature in Figures 11, 12, 13, and 14. we used the metallurgical thickness of the epitaxial layer, which allowed us to calculate the conformity between the thickness values used to solve for the concentration and resistivity versus temperature.…”
Section: Methodsmentioning
confidence: 99%
“…In 0.53 Ga 0.47 As layers were deposited by MBE on SI-InP and GaAs as well as SI-GaAs. We carried out the calculations as described previously [3] for a few samples of InAs, In 0.53 Ga 0.47 As and GaAs with different charge carrier concentrations [3,[26][27][28][29][30][31][32]. The procedure consisted of the following steps:…”
Section: Methodsmentioning
confidence: 99%
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