2009
DOI: 10.1016/j.surfcoat.2009.06.014
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Conductive and transparent Bi-doped ZnO thin films prepared by rf magnetron sputtering

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Cited by 36 publications
(13 citation statements)
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References 25 publications
(23 reference statements)
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“…Table 2. This result is against the report of M. Jiang et al [10] who observed the band gap shift from 3.24 to 3.29 eV for the Bi-doped ZnO thin films prepared by rf magnetron sputtering with increasing the argon pressure from 1.0 to 3.0 Pa. F. Chouikh et al [18] who found that the band gap shift from 3.19 to 3.24 eV for Bi-doped ZnO films deposited by ultrasonic spray pyrolysis (to 5 mol% Bi concentration). They suggested that narrowing of optical band gap might be attributed to the forming of Bi impurity energy level.…”
Section: Surface Morphologycontrasting
confidence: 95%
See 1 more Smart Citation
“…Table 2. This result is against the report of M. Jiang et al [10] who observed the band gap shift from 3.24 to 3.29 eV for the Bi-doped ZnO thin films prepared by rf magnetron sputtering with increasing the argon pressure from 1.0 to 3.0 Pa. F. Chouikh et al [18] who found that the band gap shift from 3.19 to 3.24 eV for Bi-doped ZnO films deposited by ultrasonic spray pyrolysis (to 5 mol% Bi concentration). They suggested that narrowing of optical band gap might be attributed to the forming of Bi impurity energy level.…”
Section: Surface Morphologycontrasting
confidence: 95%
“…r.f. magnetron sputtering, pulsed laser deposition (PLD), chemical vapor deposition (CVD), evaporation, metal organic chemical vapor deposition (MOCVD), sol-gel, and spray pyrolysis [10][11][12][13][14][15][16][17]. Sol-gel technique is very low-cost effective due to nanostructural preparation under low-temperature, and it is simple to control the dopant composition.…”
Section: Introductionmentioning
confidence: 99%
“…As a new type of functional material, ZnO has excellent optical and electrical properties, high chemical and mechanical stability and good heat stability together with nontoxic in nature. With exciton binding energy of 60 meV (the ionization energy of 26 meV at room temperature) and strong ultraviolet stimulated emission, ZnO prepared under different conditions can be applied for various purposes, including laser diodes [1], ultraviolet detectors [2], gas sensors [3], transparent electrode [4,5], electroluminescent material [6,7], surface acoustic wave devices [8], etc. ZnO, following GaN, has become a new focus of the research on the wide band-gap semiconductor.…”
Section: Introductionmentioning
confidence: 99%
“…Techniques such as slip casting, extrusion, or powder pressing have been so far used for manufacturing of support, followed by coating of several microns layers of different types of ceramics on it. For making of NF, one or more layers of coatings are necessary having pore size in the range of 1-50 nm to cover the support [6][7][8][9][10]. Among various methods of coating, chemical vapor deposition, sputtering [11], laser ablation, and sol-gel processing are used as preparation methods for thin films.…”
Section: Introductionmentioning
confidence: 99%