Conditions for the identical distribution of free carriers in thin films

Abstract

The condition of the same distribution of free carriers in thin films is necessary for comparing the mobility and analyzing the scattering mechanisms of carriers near semiconductor film/insulator interfaces. In thin film/insulator systems with different design parameters, it is difficult to ensure the same distribution of free carriers due to physical phenomenon such as the coupling effect. In this study, TCAD simulations of thin-film transistors, which have been used to monitor Si film properties, were applied to find parameters that allow tuning the potential distribution and, accordingly, the distribution of free carriers in films. It was found that such parameters are the film regime, the density of induced carriers, the gate voltage or threshold voltage of transistors. The conditions for the selection of parameters were found that ensure the same distribution of free carriers in thin-film structures for the cases of different thicknesses of films and the surrounding dielectrics. It was shown that the proposed approach can be used for a comparative analysis of the mobility in thin films and makes it possible to eliminate errors associated with different distributions of carriers in the films due to the coupling effect.