2008
DOI: 10.1016/j.cma.2008.01.007
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Concurrent quantum/continuum coupling analysis of nanostructures

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Cited by 22 publications
(10 citation statements)
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“…It is relevant to note that the effects of mechanical strain on the electrical and optical properties of both bulk and nanostructured semiconductors (Pistol et al, 1995;Johnson et al, 1998;Audoit et al, 2005;Jiang and Singh, 1997;Lyons et al, 2002;Alizadeh et al, 2004) and more recently carbon nanotubes (Heyd et al, 1997;Liu et al, 2004;Qian et al, 2008) have been recognized and thus studied for some time.…”
Section: Introductionmentioning
confidence: 99%
“…It is relevant to note that the effects of mechanical strain on the electrical and optical properties of both bulk and nanostructured semiconductors (Pistol et al, 1995;Johnson et al, 1998;Audoit et al, 2005;Jiang and Singh, 1997;Lyons et al, 2002;Alizadeh et al, 2004) and more recently carbon nanotubes (Heyd et al, 1997;Liu et al, 2004;Qian et al, 2008) have been recognized and thus studied for some time.…”
Section: Introductionmentioning
confidence: 99%
“…A multiscale concurrent approach was recently proposed by Qian et al [22]. In this approach, the tight-binding approach was integrated with the virtual atom cluster model developed earlier.…”
Section: A Multiscale Concurrent Approach To Electron-mechanical Coupmentioning
confidence: 99%
“…In many of these methods, the atomistic simulation is limited to particular regions of interest and the coupled analysis is limited to nanoscale structures and materials (e.g. carbon nanotubes (CNT)) [21,22].…”
Section: Introductionmentioning
confidence: 99%
“…Different multiscale methods have been proposed in the past for modeling CNT-RC materials accounting for the coupling of multiple length scales involved. Among them, concurrent and sequential approaches are the most widely applied [11,12]. Concurrent multiscale methodologies try to combine molecular dynamics and continuum methods, bridging the atomistic nanoscale to the continuum macroscale.…”
Section: Introductionmentioning
confidence: 99%