2018
DOI: 10.1016/j.ultramic.2017.10.002
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Concept and design of a beam blanker with integrated photoconductive switch for ultrafast electron microscopy

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Cited by 25 publications
(19 citation statements)
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“…However, several blanking methods are emerging as an alternative, in which an electron beam is periodically deflected over a small slit or aperture [19][20][21] . These methods have the advantage that no alterations have to be made to the electron source.…”
Section: A Ultrafast Electron Microscopymentioning
confidence: 99%
“…However, several blanking methods are emerging as an alternative, in which an electron beam is periodically deflected over a small slit or aperture [19][20][21] . These methods have the advantage that no alterations have to be made to the electron source.…”
Section: A Ultrafast Electron Microscopymentioning
confidence: 99%
“…To realize the pulsed beam below 580 fsec time width with high spatial and temporal coherence, we have developed a double-deflector chopping system that cancels the dynamic motion of the beam, whereas a single beam deflector inevitably causes beam motion [21]. The newly deflector cavities are properly controlled, the deviation of the electron trajectory from the optical axis is canceled (see Supplemental Material [20]).…”
Section: (B)mentioning
confidence: 99%
“…Although photoemission is commonly used in UTEM systems, there is an interesting alternative to use a blanking method, where a continuous beam is periodically swept across a slit or aperture [6,7,8]. Creating pulses in this way has the advantages that amplified laser systems are no longer required, and that no intrusive alterations to the source have to be made.…”
Section: Introductionmentioning
confidence: 99%