1972
DOI: 10.1080/00337577208231122
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Computer simulation of the penetration and backscattering of low energy krypton ions into single crystal tungsten

Abstract: The trajectories of Kr ions in the energy range 50 eV to 5 keV incident on the (100) and (1 10) surfaces of W have been followed using digital computational techniques, in which the interaction was treated as a multiparticle process rather than a sequence of binary collisions. At the higher energies (>2 keV), the latter process was found to be a good description also of the multiparticle event but at lower energies, many atoms were involved simultaneously in the ion scattering process. Probabilities of ion pen… Show more

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Cited by 16 publications
(3 citation statements)
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“…la). The measured distributions are very similar to the angular distributions of scattered Ne on Au(100) and Ar on Cu (100) [5], derived by us and by Smith et al [6] from trajectory calculations.…”
Section: Results For Low Projectile Energies; Threshold Sputtering Mesupporting
confidence: 65%
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“…la). The measured distributions are very similar to the angular distributions of scattered Ne on Au(100) and Ar on Cu (100) [5], derived by us and by Smith et al [6] from trajectory calculations.…”
Section: Results For Low Projectile Energies; Threshold Sputtering Mesupporting
confidence: 65%
“…The factor Ao accounts for the enhancement of the sputtered intensity in preferential directions and the parameter q for refraction effects; e.g., for perpendicular ejection from a (I00) surface we take Ao = 1 (no preferential sputtering) and q = 1 giving the usual expression (1 -Eb/Eo) following from the uniform potential barrier model for surface ejection. In oblique directions values of Ao and q are found either by surface ejection calculations [5,8] (2) of sputtered atoms, which follows from the above assumptions with Eo =E s +E b (E s = the energy of the sputtered atoms), to experimental energy spectra e.g., measured by Stuart and Wehner [6]. We found generally a close correspondence with the measured curves for Cu (100) surfaces if q = 1 substituted for the perpendicular and q = 2 for the oblique direction, while EM(E ) steadily increases with the projectile energy E.…”
Section: Results For Low Projectile Energies; Threshold Sputtering Mementioning
confidence: 99%
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