2017
DOI: 10.1039/c6ja00192k
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Computational model of inductively coupled plasma sources in comparison to experimental data for different torch designs and plasma conditions. Part II: theoretical model

Abstract: Computational study of ICP in a low-argon-flow and standard Fassel-type torches and comparison with experimental results.

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Cited by 8 publications
(19 citation statements)
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“…Alternatively, other researchers used water/air to cool the torch wall. 17,[19][20][21][22][23][24][25][26][27][28]34 Water cooling was very soon rejected because it lowers the sensitivity of plasma and has possible disastrous consequences in case of malfunction. Air-cooled torches, on the other hand, suffer from plasma contamination due to entrapment of air.…”
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confidence: 99%
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“…Alternatively, other researchers used water/air to cool the torch wall. 17,[19][20][21][22][23][24][25][26][27][28]34 Water cooling was very soon rejected because it lowers the sensitivity of plasma and has possible disastrous consequences in case of malfunction. Air-cooled torches, on the other hand, suffer from plasma contamination due to entrapment of air.…”
mentioning
confidence: 99%
“…The popularity of the Fassel torch over similar torches is due to its lower consumption of argon gas and radio frequency (RF) power, which are both considered favorable economic factors. The same factors later encouraged many researchers to improve the Fassel torch through various optimization procedures, , building the torch with materials other than quartz, , using alternative gases such as helium or nitrogen, external cooling with air/water, , enhancing the swirling flow pattern inside the torch, , and size reduction. , …”
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confidence: 99%
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“…of an analytical ICP source. [31][32][33][34][35][36][37][38][39][40][41][42][43][44] To the best of our knowledge, no simulation has been reported for the analysis of the noise characteristics of an analytical ICP source.…”
Section: Introductionmentioning
confidence: 99%
“…Among other plasma sources, atmospheric pressure inductively coupled plasmas (ICPs) are characterized by high enthalpy and plasma density, an absence of electrodes resulting in a high purity of the plasma, and flexibility of parameters. Because of this the ICPs have found strong practical applications in the processing of various substances, namely in the spheroidization of powder particles ([1-8] and references therein), the production of nanoparticles ( [9][10][11][12][13][14][15][16] and references therein), and as a source for atomic analysis ( [17][18][19][20][21][22][23][24][25][26][27] and references therein). The first two types are denoted here as technological ICPs (TICPs) while the last type is a spectroanalytical ICP (SICP).…”
Section: Introductionmentioning
confidence: 99%