Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control

Kim, Hyun-Sok; Hyun, Min-Sung; Ju, Jae-Wuk; Kim, Young‐Sik; Lambregts, Cees; Rhee, Peter van; Kim, Johan; McNamara, Elliott; Tel, Wim; Böcker, Paul; Oh, Nang-Lyeom; Lee, Jun-Hyung

doi:10.1117/12.2297182

Metrology, Inspection, and Process Control for Microlithography XXXII 2018

DOI: 10.1117/12.2297182

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Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control

Hyun-Sok Kim

Min-Sung Hyun

Jae-Wuk Ju

et al.

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Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control

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