2020
DOI: 10.3390/qubs4040043
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Comprehensive Understanding of Hillocks and Ion Tracks in Ceramics Irradiated with Swift Heavy Ions

Abstract: Amorphizable ceramics (LiNbO3, ZrSiO4, and Gd3Ga5O12) were irradiated with 200 MeV Au ions at an oblique incidence angle, and the as-irradiated samples were observed by transmission electron microscopy (TEM). Ion tracks in amorphizable ceramics are confirmed to be homogenous along the ion paths. Magnified TEM images show the formation of bell-shaped hillocks. The ion track diameter and hillock diameter are similar for all the amorphizable ceramics, while there is a tendency for the hillocks to be slightly bigg… Show more

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Cited by 11 publications
(13 citation statements)
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“…Obviously, the iTS calculations are consistent with TEM observations (Figure 2a,b). (ii) Recrystallization effect-comparing 0.80 MeV/u Cl ion irradiation with an E ele of 5.0 keV/nm and 0.70 MeV/u Ar ion irradiation with an E ele of 5.4 keV/nm, the energy deposition to the atoms of amorphous SiO 2 increases from 0.55 eV/atom to 0.60 eV/atom, and the corresponding atomic temperature increases from 2724 K to 3004 K. Thus, this effects leads to the transition from a completely amorphous state to a partially crystalline state at the melting region, similar to [30][31][32], demonstrating the appearance of the cylindrical recrystallization track in Figure 2d. For the Si substrate (Figure 4e,f), the atomic temperatures (715 K and 740 K) in the irradiation regions are significantly lower than the melting point T m (1420 K), and the irradiation energy deposited to atoms is lower than the critical threshold for damage production originating from the thermal spike process.…”
Section: Numerical Calculations Of the Its Modelmentioning
confidence: 91%
“…Obviously, the iTS calculations are consistent with TEM observations (Figure 2a,b). (ii) Recrystallization effect-comparing 0.80 MeV/u Cl ion irradiation with an E ele of 5.0 keV/nm and 0.70 MeV/u Ar ion irradiation with an E ele of 5.4 keV/nm, the energy deposition to the atoms of amorphous SiO 2 increases from 0.55 eV/atom to 0.60 eV/atom, and the corresponding atomic temperature increases from 2724 K to 3004 K. Thus, this effects leads to the transition from a completely amorphous state to a partially crystalline state at the melting region, similar to [30][31][32], demonstrating the appearance of the cylindrical recrystallization track in Figure 2d. For the Si substrate (Figure 4e,f), the atomic temperatures (715 K and 740 K) in the irradiation regions are significantly lower than the melting point T m (1420 K), and the irradiation energy deposited to atoms is lower than the critical threshold for damage production originating from the thermal spike process.…”
Section: Numerical Calculations Of the Its Modelmentioning
confidence: 91%
“…Ion irradiation parameters such as ion type, energy and fluence can be easily tuned to achieve the desired densities of defects at pre-defined depths [ 1 , 2 , 3 ]. Furthermore, high-energy heavy ion irradiation can also be used, with a great degree of control, to change material surfaces [ 4 , 5 , 6 ] and create nanomaterials [ 7 , 8 , 9 , 10 , 11 ]. These attractive possibilities stem from the fact that high-energy heavy ions travel through the material in almost straight lines.…”
Section: Introductionmentioning
confidence: 99%
“…Meanwhile, the increase in the coolant temperature, as well as the core operating temperature, requires the use of new types of reactor materials that have high melting temperatures (above 2000 °C), as well as good indicators of resistance to external influences, including mechanical and radiation damage [ 5 , 6 , 7 , 8 ]. There are also additional requirements for these materials used as structural materials, concerning safety and resistance to radiation defects and subsequent effects associated with their accumulation in the damaged layer exposed to irradiation, which can be several tens of microns thick [ 9 , 10 , 11 ]. The main effects caused by irradiation usually consist in the destruction of crystalline and chemical bonds, as well as disordering, amorphization, or swelling processes [ 12 , 13 , 14 , 15 ].…”
Section: Introductionmentioning
confidence: 99%