Abstract:Optoelectronic performance of ultraviolet phototransistors (UVPTs) based on AlGaN/GaN high-electron-mobility transistor (HEMT) configuration is comprehensively studied under different illumination wavelengths, light power densities, gate biases, and drain voltages. A special photoresponse mechanism combining photovoltaic effect and photoconductive effect is proposed to explain the variation of detection performance with the optical and electrical conditions. By comparing the photoreponse characteristics under … Show more
“…Apart from PDCR and responsivity, specific detectivity D* is also calculated to quantitively assess the sensitivity performance of the photodetector. Assuming that the total noise is primarily caused by the shot noise from the dark current, and the measurements of the photocurrents and dark current were done under the same filtering condition, D* can be determined by 41,42 * = i k j j j j j y { z z z z z D R A qI 2 dark 0.5 (4) where A denotes the photodetector active area. Using the peak responsivity at 1 × 10 −3 mW/cm 2 , detectivities of this device at different bias voltages are calculated and plotted in Figure 3e.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Substantial effort has been directed into the development of ultraviolet (UV) photodetectors on epitaxy heterojunctionsaluminum gallium nitride/gallium nitride (AlGaN/GaN) platforms in the past three decades. − As representatives of wide band gap semiconductors, AlGaN and GaN feature intrinsic visible-blind optoelectronic characteristics, as well as properties like high physical and chemical stability, high radiation and high temperature tolerance, etc. , Compared with pure GaN or AlGaN, the heterojunction AlGaN/GaN further acquires high electron concentration and high electron mobility due to the existence of two-dimensional electron gas (2DEG) at the heterointerface. − Therefore, unprecedentedly good performances such as ultra-high photo-to-dark current ratio (PDCR), high gain, and high responsivity have been embodied by AlGaN/GaN-based phototransistors and detectors . For example, the p-GaN/AlGaN/GaN phototransistor proposed by Wang et al exhibits a high PDCR of 1.4 × 10 11 and a great UV/visible rejection ratio of 4.8 × 10 7 .…”
Section: Introductionmentioning
confidence: 99%
“…However, these superior performances depend primarily on the bias voltage applied to these devices. The typical working bias of these AlGaN/GaN-based UV phototransistors and detectors is in a range from 5 to 15 V. ,− For some designs of phototransistors (except the floating p-GaN gated structures), ,, additional gate bias around 5 V is also required. ,,, Hypothetically, if these devices were to be biased below 500 mV, up to 60–99% performance degradation would manifest in their applications.…”
Section: Introductionmentioning
confidence: 99%
“…7−9 Therefore, unprecedentedly good performances such as ultra-high photo-to-dark current ratio (PDCR), high gain, and high responsivity have been embodied by AlGaN/GaN-based phototransistors and detectors. 4 For example, the p-GaN/AlGaN/GaN phototransistor proposed by Wang et al 10 exhibits a high PDCR of 1.4 × 10 11 and a great UV/visible rejection ratio of 4.8 × 10 7 . Zhang et al 11 demonstrated a Ni/Au-gated AlGaN/GaN phototransis-tor with an extremely high responsivity of 3.6 × 10 7 A/W toward 265 nm UV.…”
This study presents an AlGaN/GaN ultraviolet (UV) photodetector
proven to be highly effective when working under an ultra-low bias
voltage. The proposed photodetector is based on an innovative configuration
consisting of repetitive AlGaN/GaN fin-shaped capacitor units, which
make use of the two-dimensional electron gas (2DEG) layer as the positive
field plates and the sidewall tungsten Schottky metal as the ground
plates to surround the bulk of photocarrier generation space. Furthermore,
a unique partial sidewall oxide structure is fabricated to partition
the 2DEG field plates from the ground plates and to enable proper
depletion field formation. With the special structure design, the
symmetrical three-dimensional depletion fields are formed within each
fin-shaped capacitor unit to spatially pinch off the entire bulk region
at an ultra-low bias voltage. Effective photocarrier collection can
then be achieved by such an extensive field coverage. When biased
at 100 mV, intriguing performances in response to 365 nm UV were demonstrated
by the fabricated prototype, such as a photocurrent-to-dark-current-ratio
of 7.0 × 104, a peak responsivity of 1.1 × 103 A/W, as well as a large detectivity of 1.1 × 1016 Jones. Good transient performance was also observed under
365 nm UV pulses of 0.7 mW/cm2 in intensity with an operating
frequency of up to 1 kHz. This work embodies an ultra-low voltage
UV photodetector on the AlGaN/GaN epitaxy
heterojunction platform with concise and complementary metal-oxide-semiconductor
(CMOS)-compatible fabrication procedures, opening up an appealing
potential in ultra-low-power optoelectronic integrated circuits for
future Internet of Things and edge computing applications.
“…Apart from PDCR and responsivity, specific detectivity D* is also calculated to quantitively assess the sensitivity performance of the photodetector. Assuming that the total noise is primarily caused by the shot noise from the dark current, and the measurements of the photocurrents and dark current were done under the same filtering condition, D* can be determined by 41,42 * = i k j j j j j y { z z z z z D R A qI 2 dark 0.5 (4) where A denotes the photodetector active area. Using the peak responsivity at 1 × 10 −3 mW/cm 2 , detectivities of this device at different bias voltages are calculated and plotted in Figure 3e.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Substantial effort has been directed into the development of ultraviolet (UV) photodetectors on epitaxy heterojunctionsaluminum gallium nitride/gallium nitride (AlGaN/GaN) platforms in the past three decades. − As representatives of wide band gap semiconductors, AlGaN and GaN feature intrinsic visible-blind optoelectronic characteristics, as well as properties like high physical and chemical stability, high radiation and high temperature tolerance, etc. , Compared with pure GaN or AlGaN, the heterojunction AlGaN/GaN further acquires high electron concentration and high electron mobility due to the existence of two-dimensional electron gas (2DEG) at the heterointerface. − Therefore, unprecedentedly good performances such as ultra-high photo-to-dark current ratio (PDCR), high gain, and high responsivity have been embodied by AlGaN/GaN-based phototransistors and detectors . For example, the p-GaN/AlGaN/GaN phototransistor proposed by Wang et al exhibits a high PDCR of 1.4 × 10 11 and a great UV/visible rejection ratio of 4.8 × 10 7 .…”
Section: Introductionmentioning
confidence: 99%
“…However, these superior performances depend primarily on the bias voltage applied to these devices. The typical working bias of these AlGaN/GaN-based UV phototransistors and detectors is in a range from 5 to 15 V. ,− For some designs of phototransistors (except the floating p-GaN gated structures), ,, additional gate bias around 5 V is also required. ,,, Hypothetically, if these devices were to be biased below 500 mV, up to 60–99% performance degradation would manifest in their applications.…”
Section: Introductionmentioning
confidence: 99%
“…7−9 Therefore, unprecedentedly good performances such as ultra-high photo-to-dark current ratio (PDCR), high gain, and high responsivity have been embodied by AlGaN/GaN-based phototransistors and detectors. 4 For example, the p-GaN/AlGaN/GaN phototransistor proposed by Wang et al 10 exhibits a high PDCR of 1.4 × 10 11 and a great UV/visible rejection ratio of 4.8 × 10 7 . Zhang et al 11 demonstrated a Ni/Au-gated AlGaN/GaN phototransis-tor with an extremely high responsivity of 3.6 × 10 7 A/W toward 265 nm UV.…”
This study presents an AlGaN/GaN ultraviolet (UV) photodetector
proven to be highly effective when working under an ultra-low bias
voltage. The proposed photodetector is based on an innovative configuration
consisting of repetitive AlGaN/GaN fin-shaped capacitor units, which
make use of the two-dimensional electron gas (2DEG) layer as the positive
field plates and the sidewall tungsten Schottky metal as the ground
plates to surround the bulk of photocarrier generation space. Furthermore,
a unique partial sidewall oxide structure is fabricated to partition
the 2DEG field plates from the ground plates and to enable proper
depletion field formation. With the special structure design, the
symmetrical three-dimensional depletion fields are formed within each
fin-shaped capacitor unit to spatially pinch off the entire bulk region
at an ultra-low bias voltage. Effective photocarrier collection can
then be achieved by such an extensive field coverage. When biased
at 100 mV, intriguing performances in response to 365 nm UV were demonstrated
by the fabricated prototype, such as a photocurrent-to-dark-current-ratio
of 7.0 × 104, a peak responsivity of 1.1 × 103 A/W, as well as a large detectivity of 1.1 × 1016 Jones. Good transient performance was also observed under
365 nm UV pulses of 0.7 mW/cm2 in intensity with an operating
frequency of up to 1 kHz. This work embodies an ultra-low voltage
UV photodetector on the AlGaN/GaN epitaxy
heterojunction platform with concise and complementary metal-oxide-semiconductor
(CMOS)-compatible fabrication procedures, opening up an appealing
potential in ultra-low-power optoelectronic integrated circuits for
future Internet of Things and edge computing applications.
“…Among them, GaNbased high-electron-mobility transistors (HEMTs) have received more attention for high-efficiency UV PDs [4][5][6]. Thanks to the high-density two-dimensional electron gas (2DEG) in the interface of AlGaN/GaN heterostructure, an ultrahigh photoresponsivity and ultrafast photoresponse can be observed in the HEMT-based UV PDs [7][8][9]. In addition, the transistor operation provides the HEMT-based UV PDs 1 Dingbo Chen and Penghao Zhang contribute equally to this paper.…”
We report ultraviolet phototransistors (UVPTs) based on p-GaN/AlGaN/GaN high-electron-mobility transistors (HEMTs). Thanks to the effective depletion of the two-dimensional electron gas by the p-GaN layer, a dark current as low as 5.2×10-10 A/mm was achieved. Moreover, a unique sub-saturated region can be formed in the transfer curve of the UVPTs due to the special photogenerated electric field in the heterostructure, which endows the device with a large photo-to-dark current ratio over 105. In particular, responsivity up to 1.3×108 and 6.1×103 A/W was demonstrated at gate voltage of 5 and 0.68 V, respectively. The minimum rise time and fall time of the device transient response were measured to be around 1.8 ms and 8.8 ms, respectively. This work shows great UV detection potential of the p-GaN/AlGaN/GaN HEMTs, which opens up possibilities of realizing multifunctional enhancement HEMTs for future III-V photonic integrated devices and systems.
An Al0.4Ga0.6N-based metal–semiconductor–metal (MSM) ultraviolet (UV) photodetector (PD) based on intentionally asymmetrical polarized Al0.55Ga0.45N/Al0.4Ga0.6N/Al0.65Ga0.35N heterostructure has been fabricated and investigated, which achieves the self-powered capabilities. Operated at zero bias, the device presents an ultralow dark current of 7.8 × 10−13 A, a high peak responsivity of 0.04 A/W at ∼275 nm, a cut-off wavelength at ∼285 nm, and a corresponding detectivity of 3.1 × 1012 Jones. In comparison, the device with symmetrical heterostructure has no response at 0 V, confirming the effect of the proposed asymmetrical MSM structure. Furthermore, it is expressly demonstrated that the structure provides an asymmetrical energy band due to different barrier heights at the metal/Al0.4Ga0.6N and metal/Al0.55Ga0.45N/Al0.4Ga0.6N Schottky contacts and enhances the built-in electric field in the Al0.4Ga0.6N active layer owing to its polarization effect through simulations theoretically. Therefore, the improvement of photogenerated carrier transport can be obtained at 0 V, contributing to the high-performance self-powered UV PD.
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