2014
DOI: 10.1063/1.4902389
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Compositional tuning of atomic layer deposited MgZnO for thin film transistors

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Cited by 38 publications
(27 citation statements)
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“…However, as the Nb cycle percentage increases, the films become amorphous while shifting the band gap to higher energies. Optimum TFT performance was achieved with 175 C 3.8% NbZnO where the l sat is superior to ALD ZnO doped with Mg 9 and Si. 8 See supplementary material for XPS CL spectra of bulk Nb 2 O 5 O 1s and the effects of annealing in air on 12.5% NbZnO O 1s.…”
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confidence: 89%
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“…However, as the Nb cycle percentage increases, the films become amorphous while shifting the band gap to higher energies. Optimum TFT performance was achieved with 175 C 3.8% NbZnO where the l sat is superior to ALD ZnO doped with Mg 9 and Si. 8 See supplementary material for XPS CL spectra of bulk Nb 2 O 5 O 1s and the effects of annealing in air on 12.5% NbZnO O 1s.…”
mentioning
confidence: 89%
“…Research into non-indium based ZnO materials for TFT application includes: gallium, 7 silicon, 8 and magnesium. 9 These dopants act as effective oxygen vacancy (V o ) suppressors and can further increase the band-gap of the ZnO through the Burstein-Moss effect. [7][8][9] Niobium (Nb) has the potential as a dopant, due to its high valency (Nb 5þ ) which offers the prospect of a V o suppressor, superior to the dopants gallium (Ga 3þ ), silicon (Si 4þ ), and magnesium (Mg 2þ ).…”
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confidence: 99%
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“…We recently published work on doping ratios of Mg and ZnO using atomic layer deposition (ALD) [6] where the optimum thin-film transistor (TFT) performance obtained was achieved with a cycle ratio of 7:1. X-ray diffraction indicated that the film crystallinity remained constant whilst varying the Mg content.…”
Section: Introductionmentioning
confidence: 99%
“…However, indium is a rare element and is known to suffer from large price fluctuations, hence, limiting its potential to dominate the transparent conductive oxide (TCO) market. Alternative dopants for ZnO such as F [3], Li [4] Mo [5] and Mg [6][7] have been implemented to improve the electrical characteristics of the films.…”
Section: Introductionmentioning
confidence: 99%