Compositional ratio effect on the physicochemical properties of SnSe thin films

Kim, Dong-Hyun; Park, Juyun; Choi, Jinhee; Oh, Jin‐Woo; Kang, Yong‐Cheol

doi:10.1016/j.physb.2021.412890

Cited by 10 publications

(6 citation statements)

References 48 publications

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“…It was confirmed that the different compositional ratios of BTX TFs were successfully fabricated by adjusting the RF power on the Bi and Te targets as listed in Table 1. The differences in the two values (XPS vs. EDX) are likely ascribed to the TF surface region mainly contributing to the XPS signal while the bulk region mainly contributes to the EDX signal [22,23]. To elaborate, Te, which was predominately located in the bulk, would gradually proceed to relocate to the surface side as oxidation proceeded, resulting in a ratio difference compared to the bulk.…”

Section: Resultsmentioning

confidence: 99%

Etching and Compositional Ratio Effect on the Surface Properties of Bismuth Telluride Thin Films

Mun,

Han,

Yoon

et al. 2024

Surfaces

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Bismuth telluride has garnered considerable attention owing to its versatile properties applicable in thermoelectric and antibacterial domains, as well as its intriguing topological insulating properties. In this work, our group fabricated bismuth telluride thin films with various ratios using radio frequency magnetron sputtering. The surface properties of these thin films were thoroughly analyzed by employing a diverse array of analytical techniques, including X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), four-point probe and contact angle (CA) measurements. Specifically, our XPS findings indicated that Bi is more susceptible to oxidation than Te following Ar+-ion etching. Pure Te thin films exhibited the highest Rq value of 31.2 nm based on AFM and SEM results due to their larger grain sizes. The XRD patterns revealed a peak at 27.75° for thin films with 20% Te, attributed to its rhombohedral structure. Moreover, thin films with 30% Te yielded the highest weighted average work function with a value of 4.95 eV after etching. Additionally, pristine Bi and Te thin films demonstrated the most robust hydrophobic properties compared to intermediate-composition thin films, as determined by CA measurements.

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Section: Resultsmentioning

confidence: 99%

Etching and Compositional Ratio Effect on the Surface Properties of Bismuth Telluride Thin Films

Mun,

Han,

Yoon

et al. 2024

Surfaces

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“…SEM (MIRA3, TESCAN, Czech) coupled with EDX (X‐max 50, Oxford Instruments, Abingdon, UK) and AFM (Dimension FastScan, Bruker, USA) were conducted to investigate the morphology and elemental composition of the TFs. The surface wettability and surface free energy of TFs were studied with distilled water (DW) and ethylene glycol (EG) to calculate the surface free energy (SFE) by using a homemade contact angle (CA) measurement system described elsewhere 27,29 . XRD (X'Pert 3 ‐Powder, Malvern Panalytical, UK) was performed to study the crystalline structure of the TFs using a Cu Kα source with 40.0 kV of acceleration voltage and 40.0 mA of filament current.…”

Section: Methodsmentioning

confidence: 99%

Tailoring the surface properties of molybdenum oxytelluride thin films by its compositional ratio

Han,

Yoon,

Park

et al. 2024

Surface & Interface Analysis

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In this work, RF magnetron co‐sputtering was used to fabricate molybdenum oxytelluride thin films with different atomic ratios. Scanning electron micrographs and atomic force micrographs revealed that pure Mo thin films were segregated. Thin films with 40% Te content portrayed needle‐like structures and thus had the largest Rq value of 2.48 nm. Contact angle measurements further supported the findings as the thin films with 40% Te content were the most hydrophobic. X‐ray photoelectron spectroscopy results revealed that the major oxidation states of Mo from Te‐poor to Te‐rich TFs were changed from high (+6) to low (+4 and/or +2). X‐ray diffraction data showed that peaks pertaining to molybdenum oxide species appeared, notably at 33.048° and 33.115°. Ultraviolet photoelectron spectroscopy and Kelvin probe measurements evinced that the work function increases with increasing Te content. Four‐point probe measurements revealed that molybdenum oxytelluride thin films tend to have higher electrical conductivity than pure Mo and Te thin films.

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“…SnTe TFs were fabricated by depositing target materials on Si(100) substrates using a homemade RF magnetron cosputtering system. [25][26][27] Fabrication of TFs was performed in the cosputtering chamber. The base pressure of the cosputtering chamber was maintained at 2.4 Â 10 À2 Pa using two rotary pumps (RPs) and a turbo molecular pump (TMP).…”

Section: Fabrication Methods Of Tin Telluride Thin Filmsmentioning

confidence: 99%

Physicochemical Properties of SnTe Thin Films Dependent on Compositional Ratios

Yoon¹,

Lee²,

Park³

et al. 2022

Physica Status Solidi (a)

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This study introduces physicochemical properties based on the compositional ratio of the SnTe thin films (TFs) fabricated by radio frequency (RF) magnetron cosputtering. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) results show that the grain sizes decrease with increasing Te content, with pure Te TFs yielding the lowest Rq value (root mean square value of roughness) of 0.76 nm. Contact angle (CA) measurements show that pure Te TFs pertain to the highest total surface free energy. X‐Ray diffraction (XRD) patterns strongly indicate that pure Te TFs exhibit a hexagonal crystal structure and pure Sn TFs exhibit a tetragonal crystal structure. The dominant oxide species on the surface is TeO2 for Te‐rich films, which is deduced by X‐Ray photoelectron spectroscopy (XPS) results. Pure Te TFs yield a work function value of 4.88 eV when measured with ultraviolet photoelectron spectroscopy (UPS) and 5.46 eV when measured with a Kelvin probe. SnTe TFs with 70% Te content exhibit the lowest electrical conductivity among the fabricated TFs.

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Compositional ratio effect on the physicochemical properties of SnSe thin films

Cited by 10 publications

References 48 publications

Etching and Compositional Ratio Effect on the Surface Properties of Bismuth Telluride Thin Films

Etching and Compositional Ratio Effect on the Surface Properties of Bismuth Telluride Thin Films

Tailoring the surface properties of molybdenum oxytelluride thin films by its compositional ratio

Physicochemical Properties of SnTe Thin Films Dependent on Compositional Ratios

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