Compositional effects in the dissolution of multicomponent silicate glasses in aqueous HF solutions

Spierings, G. A. C. M.

doi:10.1007/bf01124681

Cited by 34 publications

(24 citation statements)

References 16 publications

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“…Due to its open structure and the presence of already broken siloxane bonds it will dissolve more rapidly than vitreous SiO z and increasingly so as the network modifier content is larger. Furthermore, there are indications [21] that fluorine species also diffuse into this hydrated material attacking Si-O-Si bonds positioned within the hydrated material. The small effect on the etch rate by partially replacing Na20 by CaO in a sodium calcium silicate glass [21] is an indirect proof for this mechanism.…”

Section: Effect Of Network-modifying Oxidesmentioning

confidence: 95%

“…The mechanism(s) proposed for the dissolution of vitreous SiO2 described above can also be applied to the dissolution of glasses with more complex compositions [21] and for compositionally related crystalline silicates such as m-quartz [22] and feldspars [12,13,23]. However, the etch rate varies widely.…”

Section: The Etching Process 21 Reaction Mechanismmentioning

confidence: 96%

“…When a smooth, e.g. polished, surface is etched the surface roughens slightly and cusp-like structures are formed [7,21,36]. A SEM micrograph (Fig.…”

Section: S U R F a C E M O R P H O L O G Ymentioning

confidence: 99%

“…In aqueous solutions (such as HF etchants) these mobile monovalent and bivalent ions (such as Na § and Ca z+) are leached out of the glass and are replaced by ion-exchanged H30 + ions, which form =SiOH groups [19,58]. The formation of this hydrated silica film preceeds the dissolution of the material in the HF etchant [21,59]. Due to its open structure and the presence of already broken siloxane bonds it will dissolve more rapidly than vitreous SiO z and increasingly so as the network modifier content is larger.…”

Section: Effect Of Network-modifying Oxidesmentioning

confidence: 99%

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Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

1993

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The etching of silicate glasses in aqueous hydrofluoric acid solutions is applied in many technological fields. In this review most of the aspects of the wet chemical etching process of silicate glasses are discussed. The mechanism of the dissolution reaction is governed by the adsorption of the two reactive species: HF and HF 2 and the catalytic action of H + ions, resulting in the breakage of the siloxane bonds in the silicate network. The etch rate is determined by the composition of the etchant as well as by the glass, although the mechanism of dissolution is not influenced. In the second part of this review, diverse applications of etching glass objects in technology are described. Etching of SiO= and doped Si02 thin films, studied extensively for integrated circuit technology, is discussed separately.

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Section: Effect Of Network-modifying Oxidesmentioning

confidence: 95%

Section: The Etching Process 21 Reaction Mechanismmentioning

confidence: 96%

“…When a smooth, e.g. polished, surface is etched the surface roughens slightly and cusp-like structures are formed [7,21,36]. A SEM micrograph (Fig.…”

Section: S U R F a C E M O R P H O L O G Ymentioning

confidence: 99%

Section: Effect Of Network-modifying Oxidesmentioning

confidence: 99%

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Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

1993

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“…These studies are primarily concerned with the measurement of etching rates [2] and how these are related to different etchant and glass compositions [3,9,10]. It has been shown that etching rates of multicomponent glasses, where all the components dissolve in HF, have a non-trivial dependence on both the 'bonding connectivity' of the glass and the presence of reaction by-products on its surface [10]. To our knowledge, there has not been an experimental study of multicomponent glasses where different types of etchant are required.…”

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confidence: 99%

Acid polishing of lead glass

2011

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Purpose: The polishing of cut lead glass crystal is effected through the dowsing of the glass in a mixture of two separate acids, which between them etch the surface and as a result cause it to be become smooth. In order to characterise the resultant polishing the rate of surface etching must be known, but when this involves multicomponent surface reactions it becomes unclear what this rate actually is. Methods: We develop a differential equation based discrete model to determine the effective etching rate by means of an atomic scale model of the etching process. Results: We calculate the etching rate numerically and provide an approximate asymptotic estimate. Conclusions: The natural extension of this work would be to develop a continuum advection-diffusion model.

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Corrosion of Glass

Grambow

2011

Uhlig's Corrosion Handbook

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Compositional effects in the dissolution of multicomponent silicate glasses in aqueous HF solutions

Cited by 34 publications

References 16 publications

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

Acid polishing of lead glass

Corrosion of Glass

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