2019
DOI: 10.7567/1347-4065/ab0f0f
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Composition, structure, and semiconducting properties of Mg x Zr2−x N2 thin films

Abstract: Synthesis and characterization of Mg x Zr 2−x N 2 (0.5 ⩽ x ⩽ 1.8) thin films deposited by reactive magnetron co-sputtering in nitrogen plasma is reported. Composition measurements show that nitrides with low oxygen content (less than 1%) can be formed up to x = 1.0, at which point an increase in oxygen content is observed. Up to composition of x = 1.6 the Mg x Zr 2−x N 2 thin films form in a rocksalt-derived crystal structure, as revealed by X-ray diffraction measurements. At x > 1.6 the films rapidly oxidize.… Show more

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Cited by 25 publications
(41 citation statements)
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References 48 publications
(61 reference statements)
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“…Throughout the capped films, the maximum oxygen content was around 5 at. % of the anion content in the film, which is comparable to other sputtered nitrides that contain oxophylic elements like Mg[38] [39].…”
mentioning
confidence: 65%
“…Throughout the capped films, the maximum oxygen content was around 5 at. % of the anion content in the film, which is comparable to other sputtered nitrides that contain oxophylic elements like Mg[38] [39].…”
mentioning
confidence: 65%
“…for Mg-based nitrides such as MgZrN2, for which mobility was improved by more than an order of magnitude using the templating effect of epitaxial substrates 30,31 . Similar epitaxial methods or alternative growth techniques can be envisioned to reduce the defect density and improve the electron mobility in Zn2SbN3.…”
Section: Resultsmentioning
confidence: 99%
“…These compounds were all predicted to be thermodynamically stable, suggesting that they can be synthesized by physical vapor deposition. Synthesis of Mg x Zr 2−x N 2 by Bauers et al [32] confirms semiconducting properties through temperature-activated conductivity measurements and an onset in the optical absorption spectrum.…”
Section: Introductionmentioning
confidence: 79%