We calculate analytically, the epitaxial in‐plane and out‐of‐plane strains for pseudomorphic growth of monoclinic heterostructures for various substrate orientations, namely the (010) plane and all (h0l) planes, parametrized by the rotation angle θ against the (001) plane. Numerical examples are given for the sesquioxide semiconductor systems (In0.1Ga0.9)2O3/Ga2O3 (the alloy being under compressive strain) and (Al0.1Ga0.9)2O3/Ga2O3 (tensile strain). Also, we calculate the strain energy density of the epilayer. By setting the monoclinic angle of the unit cell to π/2, our theory applies also to the simpler case of orthorhombic heterostructures.
Elastic strain energy (relative units) of pseudomorphic monoclinic (In,Ga)2O3 (blue) and (Al,Ga)2O3 films (red) on β‐Ga2O3 as a function of the angle θ in the (010) azimuth