2008
DOI: 10.1063/1.2993549
|View full text |Cite
|
Sign up to set email alerts
|

Composition and luminescence of AlInGaN layers grown by plasma-assisted molecular beam epitaxy

Abstract: This version is available at https://strathprints.strath.ac.uk/19453/ Strathprints is designed to allow users to access the research output of the University of Strathclyde. Unless otherwise explicitly stated on the manuscript, Copyright © and Moral Rights for the papers on this site are retained by the individual authors and/or other copyright owners. Please check the manuscript for details of any other licences that may have been applied. You may not engage in further distribution of the material for any pro… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
7
0
1

Year Published

2009
2009
2022
2022

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 13 publications
(8 citation statements)
references
References 25 publications
0
7
0
1
Order By: Relevance
“…[33, 34]. Previous measurements in our system have given a temperature gradient, which could be considered linear in a first approach, of about −1.25 °C/mm from the centre of the wafer, although it actually becomes stronger as we get closer to the edge.…”
Section: Resultsmentioning
confidence: 97%
See 1 more Smart Citation
“…[33, 34]. Previous measurements in our system have given a temperature gradient, which could be considered linear in a first approach, of about −1.25 °C/mm from the centre of the wafer, although it actually becomes stronger as we get closer to the edge.…”
Section: Resultsmentioning
confidence: 97%
“…In order to obtain a great number of different compositions of GaAs 1 − x − y Sb x N y alloys, we take advantage of the temperature gradient present during the MBE growth from the centre of the wafer to its edge. [ 33 , 34 ]. Previous measurements in our system have given a temperature gradient, which could be considered linear in a first approach, of about −1.25 °C/mm from the centre of the wafer, although it actually becomes stronger as we get closer to the edge.…”
Section: Resultsmentioning
confidence: 99%
“…Since determining the composition of InAlGaN by HRXRD is not possible, WDX measurements were performed. 20) Figure 2 shows the In-, Al-, and Ga-content of the grown In x Al y Ga 1−x−y N layers (green circles) and Al y Ga 1−y N layers (blue triangles) at different growth conditions as determined by WDX. Furthermore, results for the composition of In x Al y Ga 1−x−y N by simulation of the gas and surface chemistry are shown.…”
Section: Methodsmentioning
confidence: 99%
“…The very low detection limits possible with WDX also allow the analysis of trace elements (Ritchie et al, 2012; Batanova et al, 2018; Vind et al, 2018) with concentrations on the order of 10 ppm (Donovan et al, 2011) being quantifiable. These same principles have then been applied to semiconductor characterization; using WDX to determine and map the composition of the main semiconductor material and trace element analysis to quantify material dopant densities and identify undesired impurities (Nakajima et al, 1978; Bejtka et al, 2008; Kusch et al, 2017). While there are more established techniques used to determine doping concentrations, such as secondary ion mass spectrometry (SIMS; Chu et al, 1998), WDX benefits from being nondestructive and allowing simultaneous acquisition of other characteristic signals such as cathodoluminescence (Lee et al, 2005; Pownceby et al, 2007; Edwards & Martin, 2011).…”
Section: Introductionmentioning
confidence: 99%