Abstract:An aerosol-chemical vapor deposition technique (ACVD) was utilized in order to deposit highly oriented, one-dimensional nanostructured metal-oxide thin films. Film morphology was controlled using various system parameters in order to obtained the desired columnar morphology. Tin dioxide (SnO2) was chosen as an electrode material due to its high theoretical charge capacity (790 mA-h-g-1), and titanium dioxide (TiO2) was chosen for its remarkable stability and low volume change during charging. The columnar morp… Show more
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