Composite Thin Film Obtained Using Tetraethoxysilane and Aimed at VOCs Detection

Hernandez, Leonardo Frois; Lima, Roberto R.; Pécoraro, Édison; Rosim-Fachini, Esteban; Silva, Maria L.P. da

doi:10.4028/www.scientific.net/msf.730-732.185

Cited by 4 publications

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References 15 publications

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“…Film chemical characteristics were studied by Fourier Transformed Infrared Spectroscopy (FTIR, Nexus 870, SAGA grazing angle attachment, Nicolet), x-ray photoelectron spectroscopy (XPS, PHI 5600 Multisystem, monochromatic Al source) and Raman microscopy (He/Ne laser, Renishaw 2000, USA). The formation and/or enhancement of surface heterogeneities were achieved by two different strategies: a) codeposition of TEOS and HFE derivative polymers which results in a silicone-like/fluorinated composite; b) TEOS deposition that originated siliconelike composite films [11], with subsequent UV exposure of pre-determined areas (UVA and UVC, with intensity light sources of 1.8 W/m 2 and 10 W/m 2 , respectively) positioned 10 cm apart from the sample. A stainless steel grid mask (orifices 1 mm in diameter and 4 mm apart) was used during UV exposure.…”

Section: Methodsmentioning

confidence: 99%

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Tetraethylortossilicate Plasma Thin Film with Hydrophilic and Hydrophobic Characteristics: Use on Passive Mixers

Hernandez

Lima

Pécoraro

et al. 2012

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This work aims to obtain plasma thin film composites with hydrophobic/hydrophilic alternated regions, which are useful for the production of miniaturized mixers. These regions were acquired by two different strategies: either the codeposition of TEOS and HFE plasma thin films or the exposition of TEOS plasma films to ultraviolet radiation (UVA and UVC). These films were characterized by several chemical and physical techniques. The refractive indexes vary from 1.4 to 1.7; infrared and photoelectron spectroscopy detect Si-O-Si and CHn species. Silicone-like structures with high or low number of amorphous carbon microparticles and with fluorinated organic clusters were produced. Cluster dimensions were in the 1-5 mm range and they are made of graphite or COF (carbon/oxygen/fluorine) compounds. Scanning electron and optical microscopy showed rough surfaces. Water contact angles were 90º; however, for TEOS films that value changed after 6 hr of UVC exposure. Moreover, after UV exposure, organic polar compounds could be adsorbed in those films and water was not. The passive mixer performance was simulated using the FemLab 3.2® program and was tested with 20 nm thick films on a silicon wafer, showing the capacity of these films to be used in such devices.

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Section: Methodsmentioning

confidence: 99%

“…For comparison, data from a film made with pure HFE are shown; on such condition, a smooth surface is obtained [9]. These samples presented a high range of cluster density and size; however, HFE/TEOS deposition usually leads to smoother surfaces than TEOS films [11]. Refractive index ranged from 1.5 to 1.7 due to the carbon residues.…”

Section: Methodsmentioning

confidence: 99%