2015
DOI: 10.1103/physrevb.92.165203
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Complexes of silicon, vacancy, and hydrogen in diamond: A density functional study

Abstract: Paramagnetic luminescent point defects in diamond are increasingly important candidates for quantum information processing applications. Recently, the coherent manipulation of single silicon-vacancy defect spins has been demonstrated in chemical vapor deposited diamond samples where silicon may be introduced as a contamination in the growth process. Hydrogen impurity may simultaneously enter diamond too and form complexes with silicon-vacancy defects. However, relatively little is known about these complexes i… Show more

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Cited by 32 publications
(24 citation statements)
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References 66 publications
(118 reference statements)
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“…Together with the observed existence of a gap between groups H and V this points towards a separate fluorescent defect complex containing silicon, e.g. the association of SiV centers with a further nearby defect, such as a vacancy, or a modified SiV complex such as SiV:H [58].…”
Section: < -(mentioning
confidence: 89%
“…Together with the observed existence of a gap between groups H and V this points towards a separate fluorescent defect complex containing silicon, e.g. the association of SiV centers with a further nearby defect, such as a vacancy, or a modified SiV complex such as SiV:H [58].…”
Section: < -(mentioning
confidence: 89%
“…Silicon-hydrogen complexes were also found in diamond 56,64 . Here, we consider complex formation of hydrogen with substitutional oxygen and oxygenvacancy defects.…”
Section: Complexes Of Hydrogen With Substitutional Oxygen and Oxygmentioning
confidence: 92%
“…In the previous (semi)local DFT studies the highly correlated ground state was not considered for O S (0) 31,33 . We showed for SiV-related defects in diamond 56 that spinpolarized hybrid density functional Fig. 6 with their corresponding labels where the zz, yy and xx components are shown by blue, green and red arrows, respectively.…”
Section: B Substitutional Oxygen Defectmentioning
confidence: 95%
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