2008
DOI: 10.1016/j.jorganchem.2007.12.022
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Complexation of tris(pentafluorophenyl)silanes with neutral Lewis bases

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Cited by 17 publications
(7 citation statements)
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“…The O 2 Si unit and the planar OPO ligand form a dihedral angle of 6.66(5)°. Similar core structures are seen in a chelated (C 6 F 5 ) 3 Si salicylaldimine complex and the related triphenylpyrithione Sn derivative . In the Sn pyrithione derivative, the hydroxylamine oxygen occupies an axial position vs an equatorial position.…”
Section: Resultsmentioning
confidence: 61%
“…The O 2 Si unit and the planar OPO ligand form a dihedral angle of 6.66(5)°. Similar core structures are seen in a chelated (C 6 F 5 ) 3 Si salicylaldimine complex and the related triphenylpyrithione Sn derivative . In the Sn pyrithione derivative, the hydroxylamine oxygen occupies an axial position vs an equatorial position.…”
Section: Resultsmentioning
confidence: 61%
“…The Si-F distance of 156.7(1) pm is in the expected range (d(Si-F) 158.5(1) pm in Si(C 6 F 5 ) 3 F, [7] d(Si-F) 156(1) pm in SiF 4 [8] ). The F-Si-C angles are slightly more acute than the C-Si-C angles.…”
mentioning
confidence: 79%
“…In contrast to this reaction, treatment of neat Si(C 2 F 5 ) 3 Cl or Si(C 2 F 5 ) 3 Br with SbF 3 yields Si(C 2 F 5 ) 3 F [Eq. (7)] as a colorless liquid which solidifies at À110 8C. A twinned crystal was obtained by in situ crystallization of the liquid sealed in a glass capillary by manually generating a suitable seed crystal slightly below the melting point first, followed by slowly cooling to À173 8C.…”
mentioning
confidence: 99%
“…The Lewis acidity at silicon can be enhanced by three strategies: (1) strong electron withdrawing substituents,8 (2) incorporation of silicon in strained cycles9 or (3) transient activation via Lewis base coordination 10. For example, the use of perfluoroaryl substituents in (C 6 F 5 ) n SiF 4– n was reported by Frohn and Dilman 11. Hoge demonstrated the C 2 F 5 group as a robust substituent for the generation of strong silicon Lewis acids 13.…”
Section: Introductionmentioning
confidence: 99%