2016
DOI: 10.1063/1.4941287
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Complementary resistive switching behaviors evolved from bipolar TiN/HfO2/Pt device

Abstract: In this letter, the dynamic evolution of TiN/HfO2/Pt device from bipolar resistive switching (BRS) to complementary resistive switching (CRS) was reported. The device exhibits the uniform BRS with long retention, good endurance, and self-compliance characteristics after the asymmetric two-step electroforming. However, BRS of the device eventually transforms to CRS after the transitional processes through controlling the compliance current. Meanwhile, the effective barrier height rises up accordingly as the dev… Show more

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Cited by 71 publications
(70 citation statements)
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“…On lowering of the operating voltage compared to cf8 ‐BRS, we observe a transition to complementary resistive switching, as shown in Figure e. This CRS mode was observed in the narrow regime of −1.2 V in the negative polarity and +1.1 V in the positive polarity, in agreement with other similar results, where a f8 type bipolar switching was observed simultaneously . CRS was attributed by Brivio et al to the presence of an oxidized TiON layer at the interface of HfO 2 and TiN generated during deposition.…”
Section: Resultssupporting
confidence: 90%
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“…On lowering of the operating voltage compared to cf8 ‐BRS, we observe a transition to complementary resistive switching, as shown in Figure e. This CRS mode was observed in the narrow regime of −1.2 V in the negative polarity and +1.1 V in the positive polarity, in agreement with other similar results, where a f8 type bipolar switching was observed simultaneously . CRS was attributed by Brivio et al to the presence of an oxidized TiON layer at the interface of HfO 2 and TiN generated during deposition.…”
Section: Resultssupporting
confidence: 90%
“…CRS was attributed by Brivio et al to the presence of an oxidized TiON layer at the interface of HfO 2 and TiN generated during deposition. However, Chen et al activated the CRS operation using in devices where TiN was used as a top electrode, thus avoiding its oxidation during deposition . Any further increase in the positive bias voltage was found to lead to a deep reset behavior, thus, crossing over to a standard cf8 type BRS, as described before.…”
Section: Resultsmentioning
confidence: 95%
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“…The creation of additional charges and trapping centers at the interface between the oxide and the gate should also be considered when revealing the real capacitance of the structure [45][46][47]. In this case also, the effect of the metal gate should be taken into account [48][49][50].…”
Section: Discussionmentioning
confidence: 99%