InAs quantum dots (QDs) were grown on SiO x films by molecular beam deposition (MBD), and then an SiO x capping layer was deposited by rf magnetron sputtering. High arsenic pressure and As 2 molecular beam flux enhanced InAs nucleation and the dot growth. Ultrahigh-density InAs QDs with 8.5 × 10 11 cm −2 was obtained for As 2 molecular beam of 3.0 × 10 −5 Torr. The amount of InAs growth grown by As 2 was about three times higher than that by As 4 . Photoluminescence (PL) properties depended on InAs QD structures. The vacuum transport process between InAs MBD and SiO x sputtering was effective to improve the quality of InAs QDs on a SiO x film. Furthermore, strong PL intensity was obtained from InAs QDs in a SiO x matrix, fabricated by the vacuum transport process.