Compatibility between two SR steppers

Tsuyuzaki, H.; Fukuda, Makoto; Suzuki, Masanori; Shibayama, A.; Ishihara, Shuji

doi:10.1016/0167-9317(94)00109-8

Search citation statements

Order By: Relevance

Paper Sections

Select...

Introduction1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

1996

2000

Publication Types

Select...

Article3

Relationship

Self Cite0

Independent3

Authors

Journals

Cited by 3 publications

(1 citation statement)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Even though improving the compatibility among steppers increases the efficiency of manufacturing, there have been few reports so far on this topic. 4 Our primary interests are the possibility of achieving a high overlay accuracy with more than one stepper and how to improve the overlay compatibility between steppers. In this article we present the overlay accuracy obtained from exposure experiments employing two steppers and an analysis of the error factors affecting overlay accuracy.…”

Section: Introductionmentioning

confidence: 99%

Overlay compatibility between two synchroton radiation steppers

Fukuda

Suzuki

Haga

et al. 2000

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

View full text Add to dashboard Cite

show abstract

Section: Introductionmentioning

confidence: 99%

Overlay compatibility between two synchroton radiation steppers

Fukuda

Suzuki

Haga

et al. 2000

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

View full text Add to dashboard Cite

show abstract

Patterning characteristics under small vibrations of the mask and wafer in SR lithography

Fukuda

Koyama

Tsuyuzaki

et al. 1996

Microelectronic Engineering

View full text Add to dashboard Cite

Mask Contamination Induced by X-Ray Exposure

Okada

Saitoh

Deguchi

et al. 1998

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

We show that the 3D charged Banados-Teitelboim-Zanelli (BTZ) black hole solution interpolates between two different 2D AdS spacetimes: a near-extremal, nearhorizon AdS 2 geometry with constant dilaton and U(1) field and an asymptotic AdS 2 geometry with a linear dilaton. Thus, the charged BTZ black hole can be considered as interpolating between the two different formulations proposed until now for AdS 2 quantum gravity. In both cases the theory is the chiral half of a 2D CFT and describes, respectively, Brown-Hennaux-like boundary deformations and near-horizon excitations. The central charge c as of the asymptotic CFT is determined by 3D Newton constant G and the AdS length l, c as = 3l/G, whereas that of the near-horizon CFT also depends on the U(1) charge Q, c nh ∝ lQ/ √ G.

show abstract

Compatibility between two SR steppers

Cited by 3 publications

References 4 publications

Overlay compatibility between two synchroton radiation steppers

Overlay compatibility between two synchroton radiation steppers

Patterning characteristics under small vibrations of the mask and wafer in SR lithography

Mask Contamination Induced by X-Ray Exposure

Contact Info

Product

Resources

About