An approach for patterning surface with different structures in a single step is demonstrated. The approach is based on the construction of nondisk shape microelectrodes combined with the feedback mode of scanning electrochemical microscopy ͑SECM͒ for generating an anisotropic flux of electroactive species. The latter attains the shape of the microelectrode and imprints its shape upon reaction with the surface. We have demonstrated this approach in two model systems. The etching of GaAs using electrogenerated bromine resulted in the formation of etching structures imprinting the shape of the Pt microelectrode on the GaAs. The second system comprised the electrogeneration of silver ions from a silver microelctrode, which reacted with a copper surface causing the deposition of silver patterns matching the shape of the silver microelectrode. SECM tips with different shapes were constructed by different methods, including electron-beam lithography.Maskless patterning of surfaces has been primarily motivated by the desire to substitute the top-down current technologies, driven by lithography. 1-3 This motivation stems from the high cost, complexity of operation, and limited resolution of conventional lithography methods. Numerous approaches have therefore been developed based on directly printing, embossing, and molding the desired structure on the surface. 4-8 Electrochemical processes for shaping and surface structuring of metals, i.e., electrochemical machining, electrochemical polishing, and electrochemical micromachining ͑EMM͒ have also been developed and applied in several important applications. 9-12 At the same time, scanning probe microscopy ͑SPM͒ techniques, e.g., scanning tunneling microscopy ͑STM͒ and atomic force microscopy ͑AFM͒, have gained much popularity as patterning tools, which are capable to position, manipulate, and fabricate a variety of structures and surfaces with nanometer and atomic resolution. A number of excellent reviews describing different approaches and applications, using SPM techniques as a means of nanofabrication, have been published. 13-18 Yet, the high resolution achieved by the scanning probe lithography is severely limited by the serial nature of the process. Among these methods, EMM is of particular interest because it enabled the direct three-dimensional ͑3D͒ molding of a shaped tool electrode on a conducting surface. 19 High-resolution patterning of metallic and semiconductor surfaces was successfully demonstrated by Kirchner et al.,11,20 Schuster et al., 12 Kock et al., 21 Trimmer et al.,22 and Allongue et al. 23 using ultrashort voltage pulses.One of SPM techniques, which has widened the range of chemical processes and surfaces that can be patterned, is scanning electrochemical microscopy ͑SECM͒. This technique, although usually limited to the micrometer range, is based on faradaic processes occurring at the tip and the surface. The SECM has been applied to modify surfaces using two main approaches, the direct mode 24-30 and the feedback mode. [31][32][33][34][35][36][37]...