Comparison of Ta₂O₅ Thin Films Deposited by “Off-axis” and “On-axis” Pulsed Laser Deposition Technique

Abstract

The crystalline properties of Ta2O5 thin films deposited by an off-axis aperture-installation-type pulsed laser deposition (PLD) technique are investigated and the results are compared to those of films deposited by the conventional on-axis technique. When the repetition frequency is lowered, the X-ray diffraction intensity of (001) peak increases in both films. This tendency, however, is more pronounced in the off-axis films. The dielectric constant of off-axis films fabricated at 20 Hz indicates a high value of about 40, and is higher than the measured value of bulk Ta2O5. Therefore, it is concluded that the off-axis aperture-installation-type pulsed laser deposition technique is effective not only for decreasing the density of droplets, but also for obtaining high-quality crystalline films.