Comparison of surface cleaning by two atmospheric pressure discharges

Thiebaut, Jean‐Marie; Belmonte, T.; Chaleix, D.; Choquet, Patrick; Baravian, G.; Puech, Vincent; Michel, H.

doi:10.1016/s0257-8972(03)00043-4

Cited by 17 publications

(9 citation statements)

References 8 publications

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“…Even if the cleaning mechanisms are not yet identified, they seem to depend on the kind of plasma source [136]. Metastable energetic species [134,136] (e.g.…”

Section: Surfaces Treatmentsmentioning

confidence: 99%

See 1 more Smart Citation

Atmospheric pressure plasmas: A review

Tendero¹,

Tixier²,

Tristant³

et al. 2006

Spectrochimica Acta Part B: Atomic Spectroscopy

1,291

740

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“…Even if the cleaning mechanisms are not yet identified, they seem to depend on the kind of plasma source [136]. Metastable energetic species [134,136] (e.g.…”

Section: Surfaces Treatmentsmentioning

confidence: 99%

“…Metastable energetic species [134,136] (e.g. N 2 , He) seem to play a determining part in contaminant destruction process.…”

Section: Surfaces Treatmentsmentioning

confidence: 99%

Atmospheric pressure plasmas: A review

Tendero¹,

Tixier²,

Tristant³

et al. 2006

Spectrochimica Acta Part B: Atomic Spectroscopy

1,291

740

View full text Add to dashboard Cite

“…Nowadays low power APPs have found a wide range of application. These non‐thermal or cold plasmas find applications in gas cleaning or surface treatments such as surface activation and cleaning . Up to now several types of cold APP‐sources have been developed such as those created by RF power or microwave excitation .…”

Section: Introductionmentioning

confidence: 99%

Determination of the Electron Temperature of Atmospheric Pressure Argon Plasmas by Absolute Line Intensities and a Collisional Radiative Model

Taghizadeh

Nikiforov

Morent

et al. 2014

Plasma Process. Polym.

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The electron temperature in atmospheric argon plasmas created by a DBD jet is determined using a combination of Absolute Line Intensity (ALI) measurements and a collisional radiative model (CRM). The ALI measurements have been performed to determine the densities of the states in the 4p level. In addition, the ground state density is taken into account, which is found via the pressure and the gas temperature. The density ratio of the ground state and 4p state gives a value of the excitation temperature, which by means of the CRM is transformed into the electron temperature. With this method, the electron temperature in the active zone of a pure argon plasma is found to be 1.27 eV which is significantly higher than the experimental value reported by others. An error analysis shows that the relative error in the electron temperature obtained in this way is about 5%. In the afterglow, the temperature decreases gradually to about 0.88 eV. The addition of 2% O2 leads to a decrease in electron temperature of about 5%.

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“…Surface contamination is removed during Ar/O 2 plasma pretreatment, during which organic residues react physically or chemically with energetic and reactive species of the plasma. The main phenomenon is likely the oxidation of the contamination, which produces volatile oxidative products that are evacuated by the gas flow. , The substrate overheating during this pretreatment also induces a thickening of the ZnO layer (Figure S3, Supporting Information), whose surface becomes rougher, as evidenced by AFM analyses (Figure S4, Supporting Information). An outward surface oxidation probably occurs, governed by the diffusion of zinc ions from the metallic zinc layer toward the surface and their reaction with oxygen ions or reactive oxygen-containing species from the plasma.…”

Section: Resultsmentioning

confidence: 99%

Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

Vandenabeele

Bulou

Maurau

et al. 2015

ACS Appl. Mater. Interfaces

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A continuous-flow plasma process working at atmospheric pressure is developed to enhance the adhesion between a rubber compound and a zinc-plated steel monofilament, with the long-term objective to find a potential alternative to the electrolytic brass plating process, which is currently used in tire industry. For this purpose, a highly efficient tubular dielectric barrier discharge reactor is built to allow the continuous treatment of "endless" cylindrical substrates. The best treatment conditions found regarding adhesion are Ar/O2 plasma pretreatment, followed by the deposition from dichloromethane of a 75 nm-thick organo-chlorinated plasma polymerized thin film. Ar/O2 pretreatment allows the removal of organic residues, coming from drawing lubricants, and induces external growth of zinc oxide. The plasma layer has to be preferably deposited at low power to conserve sufficient hydrocarbon moieties. Surface analyses reveal the complex chemical mechanism behind the establishment of strong adhesion levels, more than five times higher after the plasma treatment. During the vulcanization step, superficial ZnO reacts with the chlorinated species of the thin film and is converted into porous and granular bump-shaped ZnwOxHyClz nanostructures. Together, rubber additives diffuse through the plasma layer and lead to the formation of zinc sulfide on the substrate surface. Hence, two distinct interfaces, rubber/thin film and thin film/substrate, are established. On the basis of these observations, hypotheses explaining the high bonding strength results are formulated.

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Comparison of surface cleaning by two atmospheric pressure discharges

Cited by 17 publications

References 8 publications

Atmospheric pressure plasmas: A review

Atmospheric pressure plasmas: A review

Determination of the Electron Temperature of Atmospheric Pressure Argon Plasmas by Absolute Line Intensities and a Collisional Radiative Model

Organo-Chlorinated Thin Films Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapor Deposition for Adhesion Enhancement between Rubber and Zinc-Plated Steel Monofilaments

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