2017
DOI: 10.4172/2321-6212.1000195
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Comparison of Sequential Light, Scanning Electron and Atomic Force Examine Methods for Electron Beam Lithography Generated Patterns

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“…However, the wear appears to be in nanoscale, which is beyond the scanning ability of SEM [ 9 ]. Atomic force microscopy (AFM) is considered as one of the most suitable surface measuring methods due to the extremely high possible lateral resolution of up to 0.2 nm with a vertical resolution of up to 0.01 nm [ 10 ].…”
Section: Resultsmentioning
confidence: 99%
“…However, the wear appears to be in nanoscale, which is beyond the scanning ability of SEM [ 9 ]. Atomic force microscopy (AFM) is considered as one of the most suitable surface measuring methods due to the extremely high possible lateral resolution of up to 0.2 nm with a vertical resolution of up to 0.01 nm [ 10 ].…”
Section: Resultsmentioning
confidence: 99%