Comparison of optical waveguide losses in silicon-on-insulator

Zinke, T.; Fischer, U. H. P.; Splett, A.; Schüppert, B.; Petermann, K.

doi:10.1049/el:19931356

Cited by 28 publications

(8 citation statements)

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“…Surface roughness produces strong scattering and high propagation loss due to the high index contrast between the silicon waveguide core and the cladding (air or SiO 2 ). As such, losses of silicon waveguides tend to increase with reduction in cross section [62]. Fortunately, new waveguide fabrication processes that are in development promise low-loss waveguides with submicron cross sections [63].…”

Section: Discussionmentioning

confidence: 98%

Light Generation, Amplification, and Wavelength Conversion via Stimulated Raman Scattering in Silicon Microstructures

Jalali

Claps

Dimitropoulos

et al. 2004

Topics in Applied Physics

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Abstract. This chapter is organized in two parts. In part one, we present the theory of Spontaneous and Stimulated Raman Scattering (SRS), as well as that of Coherent Anti Stokes Raman Scattering (CARS) in silicon. The treatment of these phenomena in silicon is more complex than that in silica fiber, due to crystal symmetry considerations. We show that, because of the intrinsically large Raman coefficient in silicon, and the tight optical confinement in silicon-on-SiO2 waveguides, both amplification and wavelength conversion can be achieved in waveguides with millimeter scale lengths. In part two, we review our recent demonstration of spontaneous Raman emission, optical gain, and wavelength conversion in silicon waveguides. The chapter concludes by discussing practical issues and methods for realizing commercially viable devices.

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Section: Discussionmentioning

confidence: 98%

Light Generation, Amplification, and Wavelength Conversion via Stimulated Raman Scattering in Silicon Microstructures

Jalali

Claps

Dimitropoulos

et al. 2004

Topics in Applied Physics

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“…This results in significant power losses when coupled to a cleaved fibre positioned in a V-groove structure. Attempts to overcome this have resulted in: (1) a saw cut being made across the ends of the waveguide structure flattening the interface region [8], [9], and this can possibly introduce losses via a reduction in optical quality at the waveguide ends; and (2) the passive V-groove fibre alignment structure (Figure 1(a)) being kept separate from the optical device and aligned as a final step once the ends of the optical device have themselves been cut and mechanically polished to an optical quality [10]. A commonly used alternative to these two techniques is the formation of rib waveguide and associated waveguide facets via plasma etching techniques [1 1], [12].…”

Section: Introductionmentioning

confidence: 99%

“…The <1 1 1> planes of bulk silicon act as etch stops when these and similar anisotropic etchants are used, creating V-shaped grooves with a sidewall angle of 54.74° to the wafer surface. Similar alignment dependent processing techniques are often applied to the fabrication of active and passive rib/ridge waveguide devices in order to achieve smooth sidewalls and hence minimize optical power losses [7], [8]. The 54.74° sidewall angle present along the length of a singlemode waveguide structure, although not greatly affecting its modal distribution, is also present at its ends.…”

Section: Introductionmentioning

confidence: 99%

Novel U-groove channel for self-alignment of optical fibers with optical quality end-polished silicon rib waveguides using wet chemical micromachining techniques

Ngo¹,

Sweatman

Dimitrijev

et al. 1999

SPIE Proceedings

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This paper presents a new cost-effective fibre-to-waveguide coupling method for self-aligning optical fibres on silicon platforms, and for achieving optical quality end-polished silicon-on-insulator (SOl) single-mode rib waveguide devices using wet chemical micromachining techniques. Through accurate alignment to the <01 1> plane(s) of the (100) device layer of a sol wafer, rib waveguide devices with self-alignment features are fabricated with the ends of each waveguide wet etched and concurrently polished providing an optical quality facet or fibre-to-waveguide interface. Eliminating the need to saw cut and then mechanically polish the waveguide device ends, the overall fabrication process is simplified and provides a fibre alignment capability at the ends of the waveguide devices with an alignment accuracy limited by fibre size tolerance. Experimental measurements were carried out to verify the optical quality of the waveguide facets formed using this new technique, which proved excess facet losses of practically unmeasurable quantities. Both simulation and experimental results were obtained to verify the single-mode nature of the rib waveguides.

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“…The planes of bulk silicon act as etch stops when these and similar anisotropic etchants are used, creating V-shaped grooves with a sidewall angle of 54.74 to the wafer surface. Similar alignment dependent processing techniques are often applied to the fabrication of active and passive rib/ridge waveguide devices in order to achieve smooth sidewalls and hence minimize optical power losses [7], [8].…”

Section: Introductionmentioning

confidence: 99%

“…This results in significant power losses when coupled to a cleaved fiber positioned in a V-groove structure. Attempts to overcome this have resulted in either a saw cut being made across the ends of the waveguide structure flattening the interface region [8], [9], and this can possibly introduce losses via a reduction in optical quality at the waveguide ends. Or as depicted in Fig.…”

Section: Introductionmentioning

confidence: 99%

Self-alignment of optical fibers with optical quality end-polished silicon rib waveguides using wet chemical micromachining techniques

Ngo

Sweatman

Dimitrijev

et al. 1999

IEEE J. Select. Topics Quantum Electron.

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This paper presents a new cost-effective method for self-aligning optical fibers on silicon platforms and for achieving optical quality end-polished silicon-on-insulator (SOI) rib waveguide devices using wet chemical micromachining techniques. Through accurate alignment to the h011i plane(s) of the (100) device layer of a SOI wafer, rib waveguide devices with selfalignment features are fabricated with the ends of each waveguide wet etched and concurrently polished providing an optical quality facet or fiber-to-waveguide interface. Eliminating the need to saw cut and then mechanically polish the ends of fabricated devices, the overall fabrication process is simplified whilst also providing an integrated optic fiber alignment capability at the ends of the fabricated waveguide devices with an alignment accuracy limited by fiber size tolerance. Experimental measurements were carried out to verify the optical quality of the waveguide facets formed using this new technique which proved excess facet losses of practically unmeasurable quantities.

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Comparison of optical waveguide losses in silicon-on-insulator

Cited by 28 publications

References 0 publications

Light Generation, Amplification, and Wavelength Conversion via Stimulated Raman Scattering in Silicon Microstructures

Light Generation, Amplification, and Wavelength Conversion via Stimulated Raman Scattering in Silicon Microstructures

Novel U-groove channel for self-alignment of optical fibers with optical quality end-polished silicon rib waveguides using wet chemical micromachining techniques

Self-alignment of optical fibers with optical quality end-polished silicon rib waveguides using wet chemical micromachining techniques

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