“…In the case of electron beam (EB) writing, the chirped pattern must be written in separated fashion (by a step-chirped mask), and stitching errors occur on the boundary of the patterns, so that the pitch fluctuations are substantial [1]. On the other hand, the holographic (H) mask written by two-optical-flux interference of laser light does not in principle generate any stitching error, regardless of whether the pattern is uniform or chirped [8]. In practice, it has been confirmed that the amplitude of the GDR is smaller than that of the EB mask [8].…”