2000
DOI: 10.1007/s100510051085
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Comparison of density-functional approaches and Monte Carlo simulations for free planar films of liquid

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Cited by 18 publications
(80 citation statements)
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“…8 This approach accounts better than the OP-NLDF for properties of uniform and nonuniform helium systems. 8,9 The adsorbate-substrate interaction has been revised by Chizmeshya, Cole, and Zaremba 10 ͑CCZ͒ who proposed the expression ͑CCZ potential͒…”
Section: ͑13͒mentioning
confidence: 99%
See 1 more Smart Citation
“…8 This approach accounts better than the OP-NLDF for properties of uniform and nonuniform helium systems. 8,9 The adsorbate-substrate interaction has been revised by Chizmeshya, Cole, and Zaremba 10 ͑CCZ͒ who proposed the expression ͑CCZ potential͒…”
Section: ͑13͒mentioning
confidence: 99%
“…The corresponding expression for V H (z) is provided in a recent paper where several DF approaches are discussed. 9 Section II is devoted to examine the calculated solutions putting a special emphasis in the analysis of the surface tension. The final conclusion is presented in Sec.…”
Section: ͑13͒mentioning
confidence: 99%
“…4,[14][15][16][17] , and is known to give a good description of the T = 0 properties of the liquid-vapor interface and also of some properties of liquid 4 He on various substrates 18,19 (for a thorough comparison between these and other functionals used to describe liquid 4 He at T = 0, see Ref. 20 ). A very remarkable example of success of such theoretical framework is the prediction of the non-wetting behavior of liquid 4 He on heavy-alkali metals at zero absolute temperature 4 .…”
Section: Introductionmentioning
confidence: 99%
“…A more thorough description of the functionals considered here can be found elsewhere; 10 we instead present a brief mathematical description of each. The functionals considered in this work are all non-local in nature, but can essentially be described as a summation of long-range van der Waals attractions and short-range repulsive interactions.…”
Section: A Density Functionalsmentioning
confidence: 99%