Comparison of Cosi2- and Tisi2-Polycide Interconnections Tested by Conventional and High Accelerated Reliability Tests

Abstract

Based on 2jum-wide CoSi 2 -n'-and TiSi 2 -n+-polycide structures with a 100nm-thick silicide and a standard AlSi-metallization a comparison between conventional and the high accelerated SWEAT-test was carried out. Supported by simulations different parameters (e.g. activation energie EA) were determined by time-to-failuremeasurements. Because of comparable results out of both different tests the SWEATtest will be prefered due to short time-to-test. Also it will be shown that both silicide systems have an about three times higher activation energy for the inducing of EMbased "open"-failures than the tested standard AlSi-metallization. The failure-rate was less than 100 FIT for both polycides but because of process advantages the CoSi 2 -polycide should be a promissing metallization to improve the reliability of single and/or multilevel-metallization.