2020 Moscow Workshop on Electronic and Networking Technologies (MWENT) 2020
DOI: 10.1109/mwent47943.2020.9067463
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Comparison of Complementary JFET Parameters on Technological Processes of JSC "Integral" (Minsk) and JSC "SPE "Pulsar" (Moscow) at Low Temperatures

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Cited by 5 publications
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“…The use of complementary JFETs, which are mastered in the framework of a number of modern technological processes [10,11], provides a low noise level and increased resistance of analog microcircuits to the effects of penetrating radiation. For many problems of analog circuitry, floating FDSs are promising not only on silicon JFETs, but also on JFETs based on SiC, GaN, GaAs transistors [12].…”
Section: Introductionmentioning
confidence: 99%
“…The use of complementary JFETs, which are mastered in the framework of a number of modern technological processes [10,11], provides a low noise level and increased resistance of analog microcircuits to the effects of penetrating radiation. For many problems of analog circuitry, floating FDSs are promising not only on silicon JFETs, but also on JFETs based on SiC, GaN, GaAs transistors [12].…”
Section: Introductionmentioning
confidence: 99%